Electrodeposition of biaxially textured layers on a substrate

Abstract

Methods of producing one or more biaxially textured layer on a substrate, and articles produced by the methods, are disclosed. As exemplary method may comprise electrodepositing on the substrate a precursor material selected from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof. An exemplary article may comprise a biaxially textured base material, and at least one biaxially textured layer selected from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof. The at least one biaxially textured layer is formed by electrodeposition on the biaxially textured base material.

1 . A method of producing at least one biaxially textured layer on a substrate, comprising electrodepositing on the substrate a precursor material selected from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof. 
     
     
         2 . The method of  claim 1 , wherein the precursor material is selected from the group consisting of CeO 2 , doped CeO 2 , La 2 O 3 , Ir, Ni—Ir, Ni YSZ, Y 2 O 3 , and La—Mn—O. 
     
     
         3 . The method of  claim 1 , wherein the substrate is biaxially textured. 
     
     
         4 . The method of  claim 1 , wherein the substrate comprises Ni. 
     
     
         5 . The method of  claim 1 , wherein the substrate comprises Ni—W. 
     
     
         6 . The method of  claim 1 , wherein the precursor material is CeO 2 . 
     
     
         7 . The method of  claim 1 , wherein the precursor material is a doped CeO 2 . 
     
     
         8 . The method of  claim 1 , wherein the CeO 2  is doped with Sm, Gd, or Zr. 
     
     
         9 . The method of  claim 1 , further comprising electrodepositing CeO 2  on electrodeposited Y 2 O 3 . 
     
     
         10 . The method of  claim 1 , wherein electrodepositing is at a current density in the range of about 0.05 to 25 mA/cm 2 . 
     
     
         11 . The method of  claim 1 , wherein electrodepositing is during stirring of a bath containing the precursor material. 
     
     
         12 . The method of  claim 1 , wherein the electrodepositing is in the range of about 20° C. to 100° C. 
     
     
         13 . The method of  claim 1 , wherein electrodepositing is at about room temperature. 
     
     
         14 . The method of  claim 1 , wherein electrodepositing is for about 1 to 30 minutes. 
     
     
         15 . The method of  claim 1 , further including annealing the biaxially textured layer at about 700 to 1200° C. 
     
     
         16 . The method of  claim 1 , further including annealing the biaxially textured layer in a gas mixture. 
     
     
         17 . The method of  claim 1 , further including annealing the biaxially textured layer. 
     
     
         18 . A superconductor having a biaxially textured layer produced according to the process of  claim 1 . 
     
     
         19 . A biaxially textured article produced according to the process of  claim 1 . 
     
     
         20 . The biaxially textured article of  claim 19 , wherein the at least one biaxially textured layer is a buffer layer. 
     
     
         21 . The biaxially textured article of  claim 19 , wherein the at least one biaxially textured layer is deposited over a biaxially textured buffer layer. 
     
     
         22 . A method of producing a superconducting material having at least one biaxially textured layer, comprising:
 selecting a precursor material from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof; and   electrodepositing the selected precursor material on a biaxially textured substrate.   
     
     
         23 . The method of  claim 22 , further comprising constantly stirring a bath with the precursor material during the step of electrodepositing. 
     
     
         24 . The method of  claim 22 , further comprising thermally annealing the electrodeposited precursor material. 
     
     
         25 . The method of  claim 22 , wherein the biaxially textured substrate is Ni-based. 
     
     
         26 . The method of  claim 22 , wherein the precursor material is selected from the group consisting of CeO 2 , doped CeO 2 , La 2 O 3 , Ir, Ni—Ir, Ni, YSZ, Y 2 O 3 , and La—Mn—O. 
     
     
         27 . A biaxially textured material, comprising:
 a biaxially textured base material;   at least one biaxially textured layer selected from the group consisting rare earths, transition metals, actinides, lanthanides, and oxides thereof, the at least one biaxially textured layer formed by electrodeposition on the biaxially textured base material.   
     
     
         28 . The biaxially textured material of  claim 27 , wherein the at least one biaxially textured layer is a buffer layer. 
     
     
         29 . The biaxially textured material of  claim 27 , wherein the at least one biaxially textured layer is electrodeposited over a buffer layer. 
     
     
         30 . the biaxially textured material of  claim 27 , wherein the biaxially textured base material is Ni-based. 
     
     
         31 . The biaxially textured material of  claim 27 , wherein the at least one biaxially textured layer is selected from the group consisting of CeO 2 , doped CeO 2 , La 2 O 3 , Ir, Ni—Ir, Ni, YSZ, Y 2 O 3 , and La—Mn—O.