Method for Preparing Specimens for Microscopy

Abstract

An apparatus for preparing specimens for microscopy including equipment for providing two or more of each of the following specimen processing activities under continuous vacuum conditions: plasma cleaning the specimen, ion beam or reactive ion beam etching the specimen, plasma etching the specimen and coating the specimen with a conductive material. Also, an apparatus and method for detecting a position of a surface of the specimen in a processing chamber, wherein the detected position is used to automatically move the specimen to appropriate locations for subsequent processing.

1 - 151 . (canceled) 
     
     
         152 . A method for preparing a specimen for microscopy, comprising:
 determining a first position of a surface of said specimen along an axis of a processing chamber;   automatically moving said specimen to one or more processing locations within said processing chamber based on said first position.   
     
     
         153 . A method according to  claim 152 , said determining step further comprising determining said first position relative to a second position along said axis. 
     
     
         154 . A method according to  claim 152 , said determining step further comprising:
 generating a beam;   directing said beam at a sensor;   moving said specimen along said axis;   establishing said first position when a predetermined level is measured by said sensor.   
     
     
         155 . A method according to  claim 154 , said beam comprising a laser beam. 
     
     
         156 . A method according to  claim 154 , said predetermined level comprising approximately 50% of a level measured when said sensor is completely unobscured. 
     
     
         157 . A method according to  claim 156 , said determining step further comprising:
 (a) moving said specimen along said axis to an obscuring position in which said sensor is completely obscured and setting a blocked position variable equal to said obscuring position;   (b) moving said specimen along said axis to an unobscuring position in which said sensor is completely unobscured, obtaining an unobscured sensor level reading, and setting a clear position variable equal to said unobscuring position;   (c) moving said specimen to a midpoint position that is approximately halfway between a position equal to said blocked position variable and a position equal to said clear position variable;   (d) obtaining a current sensor level reading at said midpoint position;   (e) determining whether said current sensor level reading is equal to approximately 50% of said unobscured sensor level reading;   (f) setting said first position equal to said midpoint position if said current sensor level reading is equal to approximately 50% of said unobscured sensor level reading;   (g) setting said blocked position variable equal to said midpoint position if said current sensor level reading is less than approximately 50% of said unobscured sensor level reading and repeating steps (c) through (h) until said first position is set in step (f); and   (h) setting said clear position variable equal to said midpoint position if said current sensor level reading is greater than approximately 50% of said unobscured sensor level reading and repeating steps (c) through (h) until said first position is set in step (f).   
     
     
         158 - 164 . (canceled)