US2014079910A1PendingUtilityA1

Carbon film laminate, method of manufacturing said laminate, and lubricant using said laminate

Assignee: TSUGAWA KAZUOPriority: May 10, 2011Filed: May 10, 2012Published: Mar 20, 2014
Est. expiryMay 10, 2031(~4.8 yrs left)· nominal 20-yr term from priority
Y10T428/24355C10N 2050/10C23C 16/511C10M 103/06C10M 177/00C23C 16/0272C10M 103/02C10N 2050/08Y10T428/30C10N 2040/25C10N 2050/025C10N 2030/06C10M 2201/081C10M 2201/042C10M 2201/102C10M 2201/041C23C 16/26
37
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

An object of the invention is to provide a carbon film laminate having a sliding surface with low friction, low abrasion, and low counterpart aggressiveness using high adhesiveness to a base material, hardness, surface flatness, low counterpart aggressiveness, transparency, and high thermal conductivity which are provided to the carbon film without using liquid and semiliquid lubricants such as lubricating oil. Provided is a carbon film laminate including a base material, a carbon film adhesion reinforcing layer which is provided on the base material and which is formed from silicon oxide (SiOx, x=1 to 2) containing fluorine atoms (F) in a concentration of 1×10 19 atoms/cm 3 or more, and a carbon film that is formed on the carbon film adhesion reinforcing layer. The carbon film contains fluorine atoms in the film in a concentration of 1×10 19 to 1×10 21 atoms/cm 3 , and has an approximate spectrum curve obtained by superimposing, on a peak fitting curve A at a Bragg angle (2θ±0.5°) of 43.9° in an X-ray diffraction spectrum by CuKα 1 rays, a peak fitting curve B at 41.7° and a baseline.

Claims

exact text as granted — not AI-modified
1 . A carbon film laminate comprising:
 a base material;   a carbon film adhesion reinforcing layer which is provided on the base material and which is formed from silicon oxide (SiO x , x=1 to 2) containing fluorine atoms (F) in a concentration of 1×10 19  atoms/cm 3  or more; and   a carbon film that is formed on the carbon film adhesion reinforcing layer,   wherein the carbon film contains fluorine atoms in the film in a concentration of 1×10 19  to 1×10 21  atoms/cm 3 , and has an approximate spectrum curve obtained by superimposing, on a peak fitting curve A at a Bragg angle (2θ±0.5°) of 43.9° in an X-ray diffraction spectrum by CuKα 1  rays, a peak fitting curve B at 41.7° and a baseline (here, the fitting curve A is expressed with a curve of a Pearson VII function, the fitting curve B is expressed with a curve of an asymmetric normal distribution function, and the baseline is expressed with a linear function).   
     
     
         2 . The carbon film laminate according to  claim 1 ,
 wherein the surface roughness Ra of the carbon film is 20 nm or less.   
     
     
         3 . The carbon film laminate according to  claim 1 ,
 wherein in a power spectrum of a surface roughness contour curve of the carbon film, a scaling exponent according to a power law is 3 to 5.   
     
     
         4 . The carbon film laminate according to  claim 1 ,
 wherein a friction coefficient of the carbon film at a temperature of 0° C. to 50° C. and humidity of 10 to 100% in the air is 0.01 to 0.1.   
     
     
         5 . The carbon film laminate according to  claim 1 ,
 wherein a light transmittance of the carbon film at a wavelength of 400 to 800 nm is 55% or more.   
     
     
         6 . The carbon film laminate according to  claim 1 ,
 wherein a light transmittance of the carbon film at a wavelength of 400 to 800 nm is 80% or more.   
     
     
         7 . The carbon film laminate according to  claim 1 ,
 wherein thermal conductivity of the carbon film is 10 W/mK or more, and resistivity at 100° C. is 1×10 7  Ωcm (100° C.) or more.   
     
     
         8 . A method of manufacturing the carbon film laminate according to  claim 1 , the method comprising:
 a process of treating a surface of a base material with ultrasonic waves;   a process of allowing a nanocrystal diamond to adhere on the base material that is treated with ultrasonic waves; and   a film forming process of carrying out a CVD treatment on the base material to which the nanocrystal diamond adheres to form a carbon film,   wherein the film forming process is carried out by disposing the base material at a position at which an electron temperature of plasma becomes 0.5 to 3 eV by using a hydrogen gas, a hydrocarbon gas, an oxygen-containing gas, and a carbon fluoride-based gas.   
     
     
         9 . A lubricant, comprising:
 the carbon film laminate according to  claim 1 .

Join the waitlist — get patent alerts

Track US2014079910A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.