Co-si based copper alloy plate

Abstract

A Co—Si based copper alloy plate, comprising: Co: 0.5 to 3.0% by mass, Si: 0.1 to 1.0% by mass and the balance Cu with inevitable impurities, wherein the Co—Si based copper alloy plate satisfies the relationship {(60 degree specular gloss G(RD) in a rolling direction)−(60 degree specular gloss G(TD) in a direction transverse to rolling direction)}≧90%.

1 . A Co—Si based copper alloy plate, comprising:
 Co: 0.5 to 3.0% by mass, Si: 0.1 to 1.0% by mass and the balance Cu with inevitable impurities, wherein the Co—Si based copper alloy plate satisfies the relationship {(60 degree specular gloss G(RD) in a rolling direction)−(60 degree specular gloss G(TD) in a direction transverse to rolling direction)}≧90%. 
 
     
     
         2 . The Co—Si based copper alloy plate according to  claim 1 , wherein a surface roughness Ra(RD) in a rolling direction is ≦0.07 μm. 
     
     
         3 . The Co—Si based copper alloy plate according to  claim 2 , wherein a surface roughness Ra(RD) in a rolling direction is ≦0.50 μm. 
     
     
         4 . The Co—Si based copper alloy plate according to  claim 1 , wherein a peak position in a frequency distribution graph representing concave-convex components on a surface in the direction transverse to rolling direction is at a minus side (a concave component side) of a mean line for the roughness profile. 
     
     
         5 . The Co—Si based copper alloy plate according to  claim 1 , further comprising a total of 2.0% by mass or less of one or two or more selected from the group consisting of Mn, Fe, Mg, Ni, Cr, V, Nb, Mo, Zr, B, Ag, Be, Zn, Sn, a misch metal and P.