Defect review method and apparatus

Abstract

A candidate-defect classification method, including acquiring a scanning electron microscope image of a candidate defect detected on a sample including a pattern; computing a feature value of the candidate defect by processing the image; executing defect classification of the candidate defect as a pattern shape defect or another defect, by using the computed feature value; acquiring positional information contained in design data of the pattern regarding the candidate defect; and extracting a systematic defect from candidate defects classified as pattern shape defects, by comparing the positional information contained in the design data of the acquired candidate defect to positional information of a portion having a high probability of causing pattern formation failure, and that has been obtained from the design data of the pattern, or a systematic defect caused due to a layout shape of the pattern, or properties of a processor for forming the pattern.

What is claimed is: 
     
         1 . A candidate defect review method, comprising the steps of:
 determinating a systematic defect or not from comparing a systematic defect determination criteria and predetermined defect candidates,   wherein the systematic defect determination criteria includes information of an inter-pattern distance and a pattern width in the images of a portion of the sample having a high probability of having a pattern formation failure.   
     
     
         2 . A candidate defect review method, comprising the steps of:
 first extracting a systematic defect from candidate defects by comparing predetermined positional information of the candidate defects and predetermined positional information of a portion of the sample having a high probability of having a pattern formation failure; and   second extracting a systematic defect from candidate defects not extracted as a systematic defect by the first extracting a systematic defect is newly extracted as a systematic defect by evaluating based on a predetermined systematic defect determination criteria,   wherein the predetermined systematic defect determination criteria includes information of an inter-pattern distance and a pattern width in the images of a portion of the sample having a high probability of having a pattern formation failure.   
     
     
         3 . A computer-implemented candidate defect review apparatus, comprising:
 a systematic defect determinating section, configured to determine whether a systematic defect exists or not, from comparing a systematic defect determination criteria and predetermined defect candidates,   wherein the systematic defect determination criteria includes information of an inter-pattern distance and a pattern width in the images of a portion of the sample having a high probability of having a pattern formation failure.   
     
     
         4 . A computer-implemented candidate defect review apparatus, comprising:
 a first systematic defect determinating section, configured to extract a systematic defect from candidate defects, by comparing predetermined positional information of the candidate defects and predetermined positional information of a portion of the sample having a high probability of having a pattern formation failure; and   a second systematic defect determinating section, configured to extract a systematic defect from candidate defects not extracted systematic defects by the systematic defect determinating section,   wherein in the second systematic defect determinating section, a systematic defect is extracted by evaluating candidate defects based on a predetermined systematic defect determination criteria, and   wherein the predetermined systematic defect determination criteria includes information of an inter-pattern distance and a pattern width in the images of a portion of the sample having a high probability of having a pattern formation failure.