Coating compositions for photolithography

Abstract

Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.

1 . A method of preparing an electronic device, comprising:
 applying an organic composition on a substrate, the organic composition comprise one or more resins with modified imide groups; and   applying a further composition above the organic composition.   
     
     
         2 . The method of  claim 1  further comprising thermally treating the organic composition layer prior to applying the further composition. 
     
     
         3 . The method of  claim 2  wherein thermal treatment does not significantly increase molecular weight of the resin. 
     
     
         4 . The method of  claim 1  wherein the imide groups are substituted with ester groups or acetal groups. 
     
     
         5 . The method of  claim 1  wherein the one or more resins comprise glutarimide and/or maleimide groups and/or the organic composition comprises one or more resins with one or more chromophore groups. 
     
     
         6 . The method of  claim 1  wherein the further composition layer is a photoresist composition, a lift-off composition, a passivation composition or a hardmask composition. 
     
     
         7 . A coated substrate comprising:
 an organic composition on a substrate, the organic composition comprise one or more resins with modified imide groups; and   a further composition layer above the organic composition.   
     
     
         8 . The method of  claim 7  wherein the one or more resins comprise glutarimide and/or maleimide groups and/or one or more chromophore groups. 
     
     
         9 . An underlying coating composition comprising one or more resins comprising one or more modified imide groups. 
     
     
         10 . An organic solvent solution comprising (1) one or more organic solvents and (2) a composition of  claim 9 .