Chemical compound being used for forming a random wrinkle structure, composition containing the compound, film having the structure, method of forming the film, and oled comprising the film
Abstract
Provided are a random wrinkle structure-formable compound, a composition including the same, a film including a random wrinkle structure, a method of forming the film, and an organic light emitting device including the film. A compound according to the present invention is coated and then, a film having a surface structure of random wrinkles may be simply formed through simple ultraviolet (UV) curing or thermosetting. When the film thus formed is used in an organic light emitting device, light generated from the organic light emitting device is scattered on surfaces of the random wrinkles to prevent light guide or total reflection, and thus, light is extracted to the outside. That is, a random structure disposed at the outside of the device performs a light extraction function and consequently, light efficiency of the organic light emitting device may be increased.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A compound having a structure of Chemical Formula 1,
where X is hydrogen or a halogen element, A is a cross-linking group, Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , Y 8 , Y 9 , Y 10 , Y 11 , Y 12 , Y 13 , Y 14 , Y 15 , Y 16 , Y 17 , and Y 18 are respectively any one group selected from the group consisting of -, —O—, —S—, —COO—, —CO—, —COS—, —SO 2 —, —CONH—, and —NH—, Z n, n+1 is a repeating number of an aliphatic or aromatic group disposed between Y n and Y n+1 groups, n is 1, 2, 3, 4, 5, 7, 8, 9, 11, 12, 13, 15, 16, or 17, Z n, n+1 is an integer between 0 and 100 when n=2, 3, 4, 7, 8, 11, 12, 15, and 16, Z n, n+1 is 0 or 1 when n=1, 5, 9, 13, and 17, p is an integer between 1 and 10,000, and Y n+1 is - when Z n, n+1 is 0.
2 . The compound of claim 1 , wherein the cross-linking group has at least one structure selected from the group consisting of structures of the following Chemical Formulae 2.
3 . The compound of claim 1 , wherein X is hydrogen or fluorine and A has a structure of
4 . The compound of claim 1 , wherein the compound has any one structure selected from the group consisting of structures of the following Chemical Formulae 3,
where q is an integer between 0 and 10,000.
5 . The compound of claim 1 , wherein the compound is a liquid having a viscosity ranging from 1 cp to 1×10 7 cp at a temperature ranging from 0° C. to 50° C.
6 . A composition for forming a film having a random wrinkle structure, comprising:
the compound of claim 1 ; and a curing initiator curing the compound, wherein an amount of the curing initiator is included in a range of 0.1 wt % to 10 wt % based on a total weight, in which a weight of the compound and a weight of the curing initiator are added.
7 . The composition of claim 6 , further comprising a solvent diluting the compound,
wherein an amount of the solvent is included in a range of 1 wt % to 99 wt % based on the total weight of the composition.
8 . The composition of claim 7 , wherein the solvent is at least one selected from the group consisting of cyclopentanone, cyclohexanone, γ-butyrolactone, toluene, methanol, ethanol, ethyl ether, N,N-dimethyl acetamide, N-methylpyrrodinone, tetrahydrofuran, ethyl acetate, and hexane.
9 . The composition of claim 6 , further comprising a polymerization monomer,
wherein an amount of the polymerization monomer is included in a range of 0.1 wt % to 99.9 wt % based on the total weight of the composition.
10 . The composition of claim 9 , wherein the polymerization monomer is at least one selected from the group consisting of 2,3,4,5,6-pentafluoro styrene, divinyl benzene, methyl methacrylate, methyl acrylate, trifluoroacetic acid allyl ester, trifluoroacetic acid vinyl ester, 2,2,2,-trifluoroethyl methacrylate, acrylic acid 1,1,1,3,3,3-hexafluoroisopropyl ester, methacrylic acid 1,1,1,3,3,3,-hexafluoroisopropyl ester, 1-pentafluorophenyl-pyrrole-2,5-dione, N-methyl maleimide, N-ethyl maleimide, N-propyl maleimide, N-butyl maleimide, N-tert-butyl maleimide, N-pentyl maleimide, and N-hexyl maleimide.
11 . A method of forming a film having a random wrinkle structure, comprising:
coating a substrate with a composition including the compound of claim 1 ; and curing the composition to form a film having a surface structure of random wrinkles.
12 . The method of claim 11 , wherein the composition further includes a photocuring initiator, and an amount of the photocuring initiator is included in a range of 0.1 wt % to 10 wt % based on a total weight, in which a weight of the compound and a weight of the photocuring initiator are added,
the method further comprising irradiating the composition with ultraviolet light.
13 . The method of claim 12 , wherein the irradiating with the ultraviolet light is performed for 1 minute to 30 minutes in an inert gas atmosphere or vacuum.
14 . The method of claim 12 , further comprising thermally treating at a temperature ranging from 100° C. to 300° C., after the irradiating with the ultraviolet light.
15 . The method of claim 11 , wherein the composition further includes a thermosetting initiator, and an amount of the thermosetting initiator is included in a range of 0.1 wt % to 10 wt % based on a total weight, in which a weight of the compound and a weight of the thermosetting initiator are added,
the method further comprising thermosetting the composition at a temperature ranging from 50° C. to 100° C.
16 . The method of claim 15 , wherein the thermosetting is performed for 5 minutes or more in an inert gas atmosphere or vacuum.
17 . The method of claim 15 , further comprising thermally treating at a temperature ranging from 100° C. to 300° C., after the thermosetting.
18 . The method of claim 11 , wherein the composition does not include an initiator,
the method further comprising thermally treating the composition at a temperature of 200° C. or more.
19 . The method of claim 18 , wherein the thermally treating is performed for 5 minutes or more in air, an inert gas atmosphere, or vacuum.
20 . An organic light emitting device comprising:
a substrate including a first surface and a second surface facing each other; a first electrode, an organic light emitting layer, and a second electrode sequentially stacked on the first surface of the substrate; and a light scattering layer disposed on at least one of the second surface of the substrate and a surface of the second electrode, wherein the light scattering layer has a surface structure of random wrinkles.
21 . The organic light emitting device of claim 20 , wherein a length of the wrinkles is in a range of 200 nm to 1000 nm and a depth of the wrinkles is in a range of 500 nm to 1000 nm.
22 . The organic light emitting device of claim 20 , wherein the light scattering layer has a refractive index ranging from 1.4 to 1.8.
23 . The organic light emitting device of claim 20 , wherein the light scattering layer is formed by three-dimensionally crosslinking compounds of the following Chemical Formula 1,
where X is hydrogen or a halogen element, A is a cross-linking group, Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , Y 8 , Y 9 , Y 10 , Y 11 , Y 12 , Y 13 , Y 14 , Y 15 , Y 16 , Y 17 , and Y 18 are respectively any one group selected from the group consisting of -, —O—, —S—, —COO—, —CO—, —COS—, —SO 2 —, —CONH—, and —NH—, Z n, n+1 is a repeating number of an aliphatic or aromatic group disposed between Y n and Y n+1 groups, n is 1, 2, 3, 4, 5, 7, 8, 9, 11, 12, 13, 15, 16, or 17, Z n, n+1 is an integer between 0 and 100 when n=2, 3, 4, 7, 8, 11, 12, 15, and 16, Z n, n+1 is 0 or 1 when n=1, 5, 9, 13, and 17, p is an integer between 1 and 10,000, and Y n+1 is - when Z n, n+1 is 0.
24 . A film having a random wrinkle structure formed by three-dimensionally crosslinking compounds of the following Chemical Formula 1,
where X is hydrogen or a halogen element, A is a cross-linking group, Y 1 , Y 2 , Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , Y 8 , Y 9 , Y 10 , Y 11 , Y 12 , Y 13 , Y 14 , Y 15 , Y 16 , Y 17 , and Y 18 are respectively any one group selected from the group consisting of -, —O—, —S—, —COO—, —CO—, —COS—, —SO 2 —, —CONH—, and —NH—, Z n, n+1 is a repeating number of an aliphatic or aromatic group disposed between Y n and Y n+1 groups, n is 1, 2, 3, 4, 5, 7, 8, 9, 11, 12, 13, 15, 16, or 17, Z n, n+1 is an integer between 0 and 100 when n=2, 3, 4, 7, 8, 11, 12, 15, and 16, Z n, n+1 is 0 or 1 when n=1, 5, 9, 13, and 17, p is an integer between 1 and 10,000, and Y n+1 is - when Z n, n+1 is 0.
25 . The film of claim 24 , wherein a length of the wrinkles is in a range of 200 nm to 1000 nm and a depth of the wrinkles is in a range of 500 nm to 1000 nm.
26 . The film of claim 24 , wherein the film has a refractive index ranging from 1.4 to 1.8.Join the waitlist — get patent alerts
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