Chemical vaporizer for material deposition systems and associated methods

Abstract

System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.

We claim: 
     
         1 . A method for cleaning an injector in a chemical vaporizer, comprising:
 introducing a solvent into the vaporizer;   partially vaporizing the introduced solvent in the vaporizer into a vapor phase and a liquid phase, the vapor phase being proximate to the injector and the liquid phase being spaced apart from the injector, and the amount of solvent being sufficient such that an equilibrium between a vapor phase and a liquid phase of the solvent co-exist in the vaporizer;   contacting the solvent in the vapor phase with the injector; and   removing contaminants from the injector to the solvent in the vapor phase.   
     
     
         2 . The method of  claim 1 , further comprising maintaining the vapor phase and the liquid phase of the solvent for a period of time. 
     
     
         3 . The method of  claim 1 , further comprising exposing at least a portion of the injector to a circulating precursor flow and condensing the solvent in the vapor phase after contacting the injector. 
     
     
         4 . The method of  claim 1 , further comprising supplying heat to the vaporizer and continually vaporizing the solvent in the liquid phase with the supplied heat. 
     
     
         5 . The method of  claim 1 , further comprising monitoring a liquid content of the introduced solvent and ensuring at least a portion of the introduced solvent remains in the liquid phase. 
     
     
         6 . A method of cleaning an injector in a chemical vaporizer, comprising:
 partially vaporizing a solvent that has been introduced into the vaporizer into a vapor phase and a liquid phase such that an equilibrium between a vapor phase and a liquid phase of the solvent co-exist in the vaporizer for a period of time, the vapor phase being proximate to the injector and the liquid phase being spaced apart from the injector, and the amount of solvent being sufficient;   contacting the solvent in the vapor phase with the injector; and   removing contaminants from the injector to the solvent in the vapor phase.   
     
     
         7 . The method of  claim 6 , further comprising refluxing the solvent introduced into the vaporizer between the liquid phase and the vapor phase in the vaporizer for a period of time. 
     
     
         8 . The method of  claim 7 , wherein refluxing the solvent includes vaporizing the solvent from the liquid phase to the vapor phase, contacting the vaporized solvent with the injector, removing contaminants from the injector to the solvent in the vapor phase, and condensing the vaporized solvent contacting the injector from the vapor phase. 
     
     
         9 . The method of  claim 7 , wherein refluxing the solvent includes heating the liquid phase of the solvent and cooling the vapor phase of the solvent in the vaporizer. 
     
     
         10 . The method of  claim 6 , further comprising contacting the solvent in the vapor phase with the injector and removing residue from the injector and the vaporizer to the solvent in the vapor phase. 
     
     
         11 . The method of  claim 6 , further comprising adjusting the period of time that the vapor phase and the liquid phase of the solvent co-exist in the vaporizer based on a current condition of the solvent in the vaporizer.