US2014020509A1PendingUtilityA1
Method for preparing metal particles
Assignee: COMMISSARIAT ENERGIE ATOMIQUEPriority: Apr 18, 2011Filed: Sep 25, 2013Published: Jan 23, 2014
Est. expiryApr 18, 2031(~4.7 yrs left)· nominal 20-yr term from priority
Inventors:Mohammed Benwadih
B22F 1/054B82Y 30/00B22F 9/12B22F 9/04B22F 2999/00B22F 9/14
49
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Claims
Abstract
A method for preparing metal particles, including the steps of: depositing a metal layer on a substrate, irradiating the metal layer with a laser, a plate of a material transparent or quasi-transparent to the laser wavelength being interposed between the metal layer and the laser source.
Claims
exact text as granted — not AI-modified1 . A method for preparing metal particles, comprising the steps of:
depositing a metal layer on a substrate; irradiating the metal layer with a laser;
a plate of a material transparent or quasi-transparent to the laser wavelength being interposed between the metal layer and the laser source.
2 . The method for preparing metal particles of claim 1 , wherein the laser is an excimer laser.
3 . The method for preparing metal particles of claim 1 , wherein the plate of transparent material is in contact with the metal layer.
4 . The method for preparing metal particles of claim 1 , wherein the plate of transparent material and the metal layer are spaced apart by a distance of at most 1 mm.
5 . The method for preparing metal particles of claim 1 , wherein the plate of transparent material is made of glass, of quartz, of borosilicate, or of plastic.
6 . The method for preparing metal particles of claim 1 , wherein the laser fluence ranges between 10 and 1,000 mJ/cm 2 .
7 . The method for preparing metal particles of claim 1 , wherein the metal layer is made of:
a metal selected from the group comprising gold, copper, nickel, palladium, and silver; or of a metal oxide, advantageously AgO, ZnO, or ITO.
8 . The method for preparing metal particles of claim 1 , wherein the metal layer is deposited by physical vapor deposition (PVD), by chemical vapor deposition (CVD), or by printing.
9 . The method for preparing metal particles of claim 1 , wherein the metal layer has a thickness ranging between 10 and 200 nm when the laser has a wavelength of 248 nm or of 308 nm.
10 . The method for preparing metal particles of claim 1 , wherein the surface of the plate of transparent material opposite to the metal layer is covered with a fluorinated coating.
11 . The method for preparing metal particles of claim 1 , wherein the substrate is made of a material selected from the group comprising:
plastics, such as polyethylene naphthalate or polyimide; glass; polycarbonates; polytetrafluoroethylene; acrylate polymers; steel covered with a plastic layer having a 50-nm thickness.
12 . The method for preparing metal particles of claim 1 , wherein the particle dimension ranges between 10 and 500 nm.
13 . The method for preparing metal particles of claim 1 , wherein before irradiation, the substrate covered with the metal layer and the plate of transparent material are immersed in a liquid.
14 . The method for preparing metal particles of claim 13 , wherein the liquid has a heat conductivity greater than that of air and/or an optical index different from that of the plate of transparent material.Join the waitlist — get patent alerts
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