Coating device

Abstract

A coating device including a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.

What is claimed is: 
     
         1 . A coating method comprising:
 a substrate loading step in which a substrate is rotatably held by a substrate carrying unit while the substrate is upright and disposing the held substrate at a first position;   a coating step in which a liquid material is ejected from a nozzle to each of first and second surfaces of the substrate disposed at the first position, so as to form coating films on the first and second surfaces of the substrate;   a transferring step in which the substrate is transferred to a second position by the substrate carrying unit while the substrate is upright; and   a removing step in which part of a peripheral edge portion of the substrate disposed at the second position is accommodated by an accommodation mechanism and a cleaning liquid is ejected from a cleaning liquid nozzle to the peripheral edge portion while the substrate is upright.   
     
     
         2 . The coating method according to  claim 1 , wherein the removing step further comprises a suctioning step in which at least one of the liquid material and the cleaning liquid is suctioned. 
     
     
         3 . The coating method according to  claim 2 , wherein at least one of the liquid material and the cleaning liquid is suctioned from a lower end portion of the substrate. 
     
     
         4 . The coating method according to  claim 1 , wherein the cleaning liquid nozzle is configured to eject the cleaning liquid from the center of the substrate toward the outer peripheral portion of the substrate. 
     
     
         5 . The coating method according to  claim 1 , wherein the cleaning liquid nozzle is formed to be bent from the center toward the outer peripheral portion. 
     
     
         6 . The coating method according to  claim 1 , wherein the accommodation mechanism includes an end portion accommodation portion which accommodates a lower end portion of the substrate and a downstream accommodation portion which accommodates a downstream of the lower end portion of the substrate in a rotation direction of the substrate. 
     
     
         7 . The coating method according to  claim 6 , wherein the accommodation mechanism includes an upstream accommodation portion which accommodates an upstream of the lower end portion of the substrate in the rotation direction of the substrate. 
     
     
         8 . The coating method according to  claim 6 , wherein the end portion accommodation portion includes a nozzle insertion portion. 
     
     
         9 . The coating method according to  claim 1 , wherein the coating step further comprises accommodating the substrate disposed at the first position in a cup mechanism.