Liquid crystal display device and manufacturing method therefor

Abstract

According to a manufacturing method for a liquid crystal display device according to this application, a first terminal hole ( 3 b ) for exposure of a part of a gate line ( 52 ) is formed in a gate insulating film ( 3 ); a pixel hole ( 8 a ) for exposure of a part of a drain electrode ( 57 ) and a second terminal hole ( 8 b ) overlapping the first terminal hole ( 3 b ) in a plan view for exposure of a part of the gate line ( 52 ) are formed in a lower insulating film ( 4 ) and an upper insulating film ( 8 ); and a pixel electrode ( 9 ) connected to the drain electrode ( 57 ) via the pixel hole ( 8 a ) and a terminal ( 92 ) connected to the gate line ( 52 ) via the second terminal hole ( 8 b ) are formed.

What is claimed is: 
     
         1 . A manufacturing method for a liquid crystal display device, comprising:
 forming a gate electrode and a gate line on a transparent substrate;   forming a gate insulating film for covering the gate electrode and the gate line;   forming a first terminal hole in the gate insulating film for exposure of a part of the gate line;   forming a semiconductor layer, a source electrode, and a drain electrode on the gate insulating film;   forming a protective insulating film for covering the semiconductor layer, the source electrode, the drain electrode, and the gate line;   forming a pixel hole and a second terminal hole in the protective insulating film, the pixel hole for exposure of a part of the source electrode or the drain electrode, and the second terminal hole formed overlapping the first terminal hole in a plan view for exposure of a part of the gate line; and   forming a pixel electrode connected to the source electrode or the drain electrode via the pixel hole and a terminal connected to the gate line via the second terminal hole.   
     
     
         2 . The manufacturing method for a liquid crystal display device according to  claim 1 , wherein the second terminal hole is smaller than the first terminal hole and formed inside the first terminal hole. 
     
     
         3 . The manufacturing method for a liquid crystal display device according to  claim 1 , wherein
 the protective insulating film includes a lower insulating film and an upper insulating film, and   a common electrode is formed between the lower insulating film and the upper insulating film.   
     
     
         4 . The manufacturing method for a liquid crystal display device according to  claim 2 , wherein the gate insulating film is harder than the protective insulating film. 
     
     
         5 . A liquid crystal display device, comprising:
 a transparent substrate;   a gate electrode and a gate line formed on the transparent substrate;   a gate insulating film covering the gate electrode and the gate line;   a semiconductor layer, a source electrode, and a drain electrode formed on the gate insulating film;   a protective insulating film for covering the semiconductor layer, the source electrode, and the drain electrode;   a pixel electrode connected to the source electrode or the drain electrode via the pixel hole formed in the protective insulating film; and   a terminal connected to the gate line via the terminal hole formed in the protective insulating film, wherein   the protective insulating film directly contacts a part of the gate line that is connected to the terminal.   
     
     
         6 . The liquid crystal display device according to  claim 5 , wherein the terminal doesn't contact to the gate insulating film. 
     
     
         7 . The liquid crystal display device according to  claim 5 , wherein the protective insulating film includes a lower insulating film and an upper insulating film, and
 a common electrode is formed between the lower insulating film and the upper insulating film.