Chamber apparatus and extreme ultraviolet light generation system

Abstract

A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

1 - 21 . (canceled) 
     
     
         22 . A chamber apparatus which has an obscuration region and used with an external apparatus, the chamber apparatus comprising:
 a chamber in which extreme ultraviolet light is generated;   a plurality of collector mirrors configured for reflecting and collecting the extreme ultraviolet light;   a support configured for supporting the plurality of the collector mirrors in the chamber such that focal points of the plurality of the collector mirrors coincide with each other and a space is provided between the plurality of the collector mirrors; and   an output port provided to the chamber for allowing the extreme ultraviolet light reflected and collected by the plurality of the collector mirrors to be introduced into the external apparatus.   
     
     
         23 . The chamber apparatus according to  claim 22 , wherein the support supports the plurality of the collector mirrors so that at least a part of the space provided between the plurality of the collector mirrors is located at a portion corresponding to the obscuration region. 
     
     
         24 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes at least one inlet port through which a laser beam is introduced into the chamber from outside and a focusing optical system configured for focusing the laser beam, and   the laser beam travels through the space provided between the plurality of the collector mirrors and is focused in a predetermined region inside the chamber.   
     
     
         25 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes a target supply unit configured for supplying a target material into the chamber, and   the target material is supplied to a predetermined region inside the chamber through the space provided between the plurality of the collector mirrors.   
     
     
         26 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes a target supply unit configured for supplying a target material into the chamber and a target-collecting unit configured for collecting at least part of the target material supplied into the chamber, and   the target-collecting unit is positioned in the space provided between the plurality of the collector mirrors.   
     
     
         27 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes at least one measuring device, and   the measuring device is positioned in the space provided between the plurality of the collector mirrors.   
     
     
         28 . The chamber apparatus according to  claim 27 , wherein
 the at least one measuring device is a plasma monitor camera.   
     
     
         29 . The chamber apparatus according to  claim 27 , wherein
 the at least one measuring device is an extreme ultraviolet light energy monitor.   
     
     
         30 . The chamber apparatus according to  claim 27 , wherein
 the at least one measuring device is a target-position-measuring camera.   
     
     
         31 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes a target supply unit configured for supplying a target material into the chamber and a debris-collecting unit configured for collecting debris from the target material supplied into the chamber, and   the debris-collecting unit is positioned in the space provided between the plurality of the collector mirrors.   
     
     
         32 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes at least one inlet port through which a laser beam is introduced into the chamber from outside and a focusing optical system configured for focusing the laser beam, and   the laser beam is focused in a predetermined region inside the chamber through the space provided between the plurality of the collector mirrors.   
     
     
         33 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes a target supply unit configured for supplying a target material into the chamber, and   the target material is supplied to a predetermined region inside the chamber through the space provided between the plurality of the collector mirrors.   
     
     
         34 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes a target supply unit configured for supplying a target material into the chamber and a target-collecting unit configured for collecting at least part of the target material supplied into the chamber, and   the target-collecting unit is positioned in the space provided between the plurality of the collector mirrors.   
     
     
         35 . The chamber apparatus according to  claim 22 , wherein
 the chamber includes at least one measuring device, and   the at least one measuring device is positioned in the space provided between the plurality of the collector mirrors.   
     
     
         36 . The chamber apparatus according to  claim 35 , wherein
 the at least one measuring device is a plasma monitor camera.   
     
     
         37 . The chamber apparatus according to  claim 35 , wherein
 the at least one measuring device is an extreme ultraviolet light energy monitor.   
     
     
         38 . The chamber apparatus according to  claim 35 , wherein
 the at least one measuring device is a target-position-measuring camera.