Method for inspecting and measuring sample and scanning electron microscope

Abstract

As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

1 - 17 . (canceled) 
     
     
         18 . A method for inspecting or measuring a sample, wherein, in a scanning method thereof of an electron beam scanning, after scanning a first electron beam to a sample to charge the sample, a second electron beam is scanned to the charged sample, wherein
 a condition is established measuring the charge voltage of the sample by scanning the first electron beam.   
     
     
         19 . The method for inspecting or measuring a sample as set forth in  claim 18 , wherein the charge voltage is measured by an energy filter. 
     
     
         20 . The method for inspecting or measuring a sample as set forth in  claim 18 , wherein
 the charge voltage is measured utilizing reflection of a first electron beam by the relation between energy of the first electron beam and the charge voltage of the sample.   
     
     
         21 . A scanning electron microscope, wherein
 in a scanning method thereof of an electron beam scanning, after scanning a first electron beam to a sample to charge the sample, a second electron beam to the charged sample, a database relating the sample and the irradiation condition of the first electron beam is possessed.   
     
     
         22 . The scanning electron microscope as set forth in  claim 21 , wherein the database includes the charge voltage generated by irradiation of the first electron beam to the sample.