Systems and methods for processing thin films

Abstract

Methods and systems for processing a thin film are disclosed. Thin films are loaded onto two different loading fixtures, laser beam pulses are split into first and second laser beam pulses, the thin film loaded on one loading fixture is irradiated with the first laser beam pulses to induce crystallization while the thin film loaded on the other loading fixture is irradiated with the second laser beam pulses. At least a portion of the thin film loaded on the first and second loading fixtures is irradiated. The laser source system includes first and second laser sources and an integrator that combines the laser beam pulses to form combined laser beam pulses. The methods and system further utilize additional loading fixtures for processing additional thin film samples. The irradiation of additional thin film samples can be performed while thin film samples are being loaded onto the remaining loading fixtures.

1 . A system for processing a plurality of thin films, comprising:
 a laser source system for generating laser beam pulses each having a pulse duration;
 a first loading fixture for securing a thin film; 
 a second loading fixture for securing a thin film; 
 a beam splitting element for splitting said generated laser beam pulses into at least first laser beam pulses and second laser beam pulses; and 
 wherein a thin film loaded on said first loading fixture can be irradiated with said first laser beam pulses and a thin film loaded on said second loading fixture can be irradiated with said second laser beam pulses, and wherein at least a portion of said thin film loaded on said second loading fixture can be irradiated while said thin film loaded on said first loading fixture is being irradiated.