Methods and Apparatus for Manufacturing Micro- and/or Nano-Scale Features

Abstract

The present invention provides devices for generating scalable patterned features on a substrate. In some embodiments, the device includes a means for forming and ejecting a succession of droplets, a charge tunnel, a quadrupole mechanism, a means for reducing the size of one or more of the droplets and one or more stream deflectors.

1 . An apparatus comprising:
 (1) a means for forming and ejecting a succession of droplets;   (2) a charge tunnel;   (3) a quadrupole mechanism;   (4) a means for reducing the size of one or more of the droplets; and   (5) one or more stream deflectors.   
     
     
         2 . The apparatus of  claim 1 , wherein the means for forming and ejecting a succession of droplets is configured to selectively adjust the size, velocity and/or ejection rate of the droplets. 
     
     
         3 . The apparatus of  claim 1 , wherein the means for forming and ejecting a succession of droplets comprises a continuous ink jet apparatus, a drop-on-demand inkjet apparatus or a thermal inkjet apparatus. 
     
     
         4 . The apparatus of  claim 1 , wherein the means of droplet forming and ejecting a succession of droplets comprises a piezoelectric nozzle. 
     
     
         5 . The apparatus of  claim 4 , wherein the piezoelectric nozzle comprises a piezoelectric disk. 
     
     
         6 . The apparatus of  claim 5 , wherein the means for forming and ejecting a succession of droplets is configured to selectively vary a voltage of excitation of the piezoelectric disk. 
     
     
         7 . The apparatus of  claim 5 , wherein the means for forming and ejecting a succession of droplets is configured to selectively vary a frequency of excitation of the piezoelectric disk. 
     
     
         8 . The apparatus of  claim 5 , wherein the means for forming and ejecting a succession of droplets is configured to selectively vary an orifice diameter of the piezoelectric disk. 
     
     
         9 . The apparatus of  claim 1 , wherein the charge tunnel is configured to apply a variable charge potential to the droplets. 
     
     
         10 . The apparatus of  claim 1 , wherein the quadrupole mechanism is configured to guide the droplets in a straight line path. 
     
     
         11 . The apparatus of  claim 1 , wherein the quadrupole assembly comprises four electrodes wherein the electrodes are arranged with their axes at right angles to each other. 
     
     
         12 . The apparatus of  claim 1 , wherein the means for reducing the size of one or more of the droplets is configured to reduce the size of one or more of the droplets by at least about 20%. 
     
     
         13 . The apparatus of  claim 1 , wherein the means for reducing the size of one or more of the droplets is configured to reduce the size of one or more of the droplets from 1 to 5 μm to 80 to 200 nm. 
     
     
         14 . The apparatus of  claim 1 , wherein the means for reducing the size of one or more of the droplets comprises a heat source. 
     
     
         15 . The apparatus of  claim 1 , wherein the means for reducing the size of one or more of the droplets comprises a laser source. 
     
     
         16 . The apparatus of  claim 1 , wherein the one or more stream deflectors comprise two plates, each of which is charged. 
     
     
         17 . An apparatus, comprising:
 (1) a means for forming and ejecting a succession of droplets, comprising a piezoelectric nozzle;   (2) a charge tunnel;   (3) a quadrupole mechanism;   (4) a means for reducing the size of one or more of the droplets, comprising a heat source, a laser source or a combination thereof; and   (5) two or more charged deflector plates.   
     
     
         18 . The apparatus of  claim 17 , wherein the piezoelectric nozzle comprises a piezoelectric disk. 
     
     
         19 . The apparatus of  claim 17 , wherein the means for forming and ejecting a succession of droplets is configured to selectively vary:
 (a) a voltage of excitation of the piezoelectric disk;   (b) a frequency of excitation of the piezoelectric disk; and/or   (c) an orifice diameter of the piezoelectric disk.   
     
     
         20 . The apparatus of  claim 19 , wherein the means for reducing the size of one or more of the droplets is configured to reduce the size of one or more of the droplets by at least about 20%.