Chemical liquid preparation method of preparing a chemical liquid for substrate processing, chemical liquid preparation unit preparing a chemical liquid for substrate processing, and substrate processing system

Abstract

A substrate processing system includes a chemical liquid preparation unit preparing a chemical liquid to be supplied to a substrate and a processing unit which supplies the chemical liquid, prepared by the chemical liquid preparation unit, to the substrate. The chemical liquid preparation unit supplies an oxygen-containing gas, containing oxygen gas, to a TMAH-containing chemical liquid, containing TMAH (tetramethylammoniumhydroxide),tomaketheoxygen-containing gas dissolve in the TMAH-containing chemical liquid.

What is claimed is: 
     
         1 . A chemical liquid preparation method of preparing a chemical liquid for substrate processing, comprising:
 a step of supplying an oxygen-containing gas that contains oxygen gas to a TMAH-containing chemical liquid that contains TMAH (tetramethylammonium hydroxide) to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid.   
     
     
         2 . The chemical liquid preparation method of preparing a chemical liquid for substrate processing according to  claim 1 , wherein the oxygen-containing gas is oxygen gas or cleaned dry air. 
     
     
         3 . The chemical liquid preparation method of preparing a chemical liquid for substrate processing according to  claim 1 , comprising:
 a measurement step of measuring a dissolved oxygen concentration in the TMAH-containing chemical liquid;   a nitrogen dissolution step of supplying a nitrogen-containing gas containing nitrogen gas to the TMAH-containing chemical liquid to make the nitrogen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured in the measurement step is higher than a predetermined concentration; and   an oxygen dissolution step of supplying the oxygen-containing gas to the TMAH-containing chemical liquid to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured in the measurement step is lower than the predetermined concentration.   
     
     
         4 . A chemical liquid preparation unit preparing a chemical liquid for substrate processing, comprising:
 an oxygen dissolution unit which supplies an oxygen-containing gas that contains oxygen gas to a TMAH-containing chemical liquid that contains TMAH (tetramethylammonium hydroxide) to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid.   
     
     
         5 . The chemical liquid preparation unit preparing a chemical liquid for substrate processing according to  claim 4 , wherein the oxygen-containing gas is oxygen gas or cleaned dry air. 
     
     
         6 . The chemical liquid preparation unit preparing a chemical liquid for substrate processing according to  claim 4 , further comprising:
 a measurement unit which measures a dissolved oxygen concentration in the TMAH-containing chemical liquid;   a nitrogen dissolution unit which supplies a nitrogen-containing gas containing nitrogen gas to the TMAH-containing chemical liquid to make the nitrogen-containing gas dissolve in the TMAH-containing chemical liquid; and   a controller which controls the nitrogen dissolution unit to make the nitrogen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured by the measurement unit is higher than a predetermined concentration and controls the oxygen dissolution unit to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured by the measurement unit is lower than the predetermined concentration.   
     
     
         7 . A substrate processing system comprising:
 the chemical liquid preparation unit according to  claim 4 ; and   a processing unit which supplies the TMAH-containing chemical liquid, prepared by the chemical liquid preparation unit, to a substrate.   
     
     
         8 . A substrate processing system comprising: the chemical Liquid preparation unit according to  claim 5 ; and
 a processing unit which supplies the TMAH-containing chemical liquid, prepared by the chemical liquid preparation unit, to a substrate.   
     
     
         9 . A substrate processing system comprising: the chemical liquid preparation unit according to  claim 6 ; and
 a processing unit which supplies the TMAH-containing chemical liquid, prepared by the chemical liquid preparation unit, to a substrate.