Gas Separation Device

Abstract

A gas separation device comprises a gas separation layer, a first gas volume and a second gas volume, the gas separation layer being arranged between the first gas volume and the second gas volume, the gas separation layer having at least one aperture connecting the first gas volume to the second gas volume. The aperture is configured to taper from the first gas volume to the second gas volume and being dimensioned to enrich a component of the second gas volume in the first gas volume, wherein the aperture is configured as an elongated opening in the gas separation layer, the aperture having a minimum opening width of essentially one time to twenty times the mean free path length of the component of the second gas volume, which is to be enriched.

What is claimed is: 
     
         1 . A gas separation device comprising a gas separation layer, a first gas volume and a second gas volume, the gas separation layer being arranged between the first gas volume and the second gas volume, the gas separation layer having at least one aperture connecting the first gas volume to the second gas volume, the aperture being configured to taper from the first gas volume to the second gas volume and being dimensioned to enrich a component of the second gas volume in the first gas volume, wherein the aperture is configured as an elongated opening in the gas separation layer, the aperture having a minimum opening width of essentially one time to twenty times a mean free path length of the component of the second gas volume, which is to be enriched. 
     
     
         2 . The gas separation device of  claim 1 , wherein the aperture has a V-shaped cross-section, an opening angle of the aperture being in the range of 0.01° to 10°. 
     
     
         3 . The gas separation device of  claim 2 , wherein the aperture opening angle of the aperture is 0.7°. 
     
     
         4 . The gas separation device of  claim 1 , wherein the length of the aperture is at least ten times the minimum opening width of the aperture of the gas separation layer. 
     
     
         5 . The gas separation device of  claim 1 , wherein the gas separation layer comprises at least two triangle-shaped separation elements and at least one connector, the separation elements of the gas separation layer being fastened to the connector, and the aperture being arranged between the two separation elements. 
     
     
         6 . The gas separation device of  claim 1 , wherein the aperture comprises a gas reflection layer on a surface. 
     
     
         7 . The gas separation device of  claim 6 , wherein the gas reflection layer of the gas separation layer has a roughness Rz of 0.3 to 10 times the mean free path length. 
     
     
         8 . The gas separation device of  claim 6 , wherein a ripple of the gas reflection layer of the gas separation layer is smaller than the minimum opening width of the aperture of the gas separation layer. 
     
     
         9 . The gas separation device of  claim 1 , wherein the gas separation layer comprises a heating or cooling unit configured to heat or cool the gas separation layer and to provide a temperature gradient to any of the first and the second gas volume, the heating or cooling unit comprising the gas reflection layer, wherein the heating or cooling unit may particularly be configured as a Peltier element, wherein the gas reflection layer comprises any of a metallic, electrically conductive and semiconductive material and wherein the gas reflection layer is connected to a current source and/or to a control device. 
     
     
         10 . A gas separation device comprising a gas separation layer, a first gas volume and a second gas volume, the gas separation layer being arranged between the first gas volume and the second gas volume, the gas separation layer having at least one aperture connecting the first gas volume to the second gas volume, the aperture being configured to taper from the first gas volume to the second gas volume and being dimensioned to enrich a component of the second gas volume in the first gas volume, wherein the aperture is configured as an elongated opening in the gas separation layer, wherein the gas separation layer comprises a first plate-like separation element and a second plate-like separation element, the first separation element being arranged opposite to and at an acute angle with regard to the second separation element, and the aperture being arranged between the first and the second separation element. 
     
     
         11 . The gas separation device of  claim 10 , wherein the plate-shaped separation elements are arranged at a ring-shaped connector by their undersides, the plate-shaped separation elements having a V-shaped alignment with regard to each other. 
     
     
         12 . The gas separation device of  claim 10 , wherein the connector is configured in an adjustable manner in order to vary a distance of the separation elements to each other. 
     
     
         13 . The gas separation device of  claim 10 , wherein a plurality of separation elements are arranged in a drum-like manner, an internal space of the drum-like arrangement of the separation elements being connected to the second gas volume and at least one part of the external space around the drum-like arrangement of the separation elements being connected to the first gas volume. 
     
     
         14 . The gas separation device of  claim 10 , wherein the first and the second separation element have a structured surface and at least one shared structural point, the structured surfaces of the two separation elements being configured in such a way that the structural point determines the minimum opening width of the aperture between the separation elements. 
     
     
         15 . The gas separation device of  claims 10 , wherein the aperture comprises a gas reflection layer on a surface. 
     
     
         16 . The gas separation device of  claim 15 , wherein the gas reflection layer of the gas separation layer has a roughness Rz of 0.3 to 10 times a mean free path length of the component of the second gas volume. 
     
     
         17 . The gas separation device of  claim 15 , wherein a ripple of the gas reflection layer of the gas separation layer is smaller than a minimum opening width of the aperture of the gas separation layer. 
     
     
         18 . The gas separation device of  claim 15 , wherein the gas separation layer comprises a heating or cooling unit configured to heat or cool the gas separation layer and to provide a temperature gradient to any of the first and to the second gas volume, the heating or cooling unit comprising the gas reflection layer, wherein the heating or cooling unit may particularly be configured as a Peltier element, wherein the gas reflection layer comprises any of a metallic, electrically conductive and semiconductive material and wherein the gas reflection layer is connected to a current source and/or to a control device. 
     
     
         19 . A method for manufacturing a gas separation device in drum-shaped form, wherein a aperture with the minimum opening width is introduced into a plate-like base body of a gas separation layer by means of a tool, the plate-like base body of the gas separation layer being rolled, a rolling radius determining the opening angle of the aperture of the gas separation layer. 
     
     
         20 . A method of  claim 19 , wherein at least one aperture is introduced into a flexible material of the base body by means of a tool, wherein the base body is subsequently tensioned and wherein a gas reflection layer is subsequently deposited at least in the area of the aperture, particularly by means of spraying. 
     
     
         21 . The method of  claim 20 , wherein the gas reflection layer is post-treated by means of a method assigning hydrophobic properties to a gas reflection layer, particularly a lotus effect.