Exhaust apparatus, processing apparatus, and device manufacturing method

Abstract

An exhaust apparatus includes a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a regulator configured to regulate a temperature of the structural member. The structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other. The apparatus is configured such that the vacuum pump exhausts a gas via the through hole.

1 . A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust device configured to exhaust a gas from the vacuum vessel, the exhaust device including:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust device is configured such that the vacuum pump exhausts a gas via the through hole; 
   a heat reflector arranged in the vacuum vessel so as to be separated from and so as to face the second end face;   a heat-radiating member arranged in the vacuum vessel so as to receive heat reflected by the heat reflector; and   a second regulator configured to regulate a temperature of the heat-radiating member.   
     
     
         2 . The processing apparatus according to  claim 1 , wherein the through hole is a hollow circular cylinder, and
 wherein the structural member includes a bundle of the circular cylinders.   
     
     
         3 . The processing apparatus according to  claim 1 , wherein the structural member has a flow path for a medium, and
 wherein the first regulator is configured to cause the medium whose temperature is regulated to flow via the flow path.   
     
     
         4 . The processing apparatus according to  claim 1 , further comprising a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate,
 wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel.   
     
     
         5 . A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel;   an exhaust device connected to the exhaust vessel and configured to exhaust a gas from the vacuum vessel, the exhaust device including:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust device is configured such that the vacuum pump exhausts a gas via the through hole; 
   a heat reflector arranged in the exhaust vessel so as to be separated from and so as to face the second end face;   a heat-radiating member arranged in the exhaust vessel so as to receive heat reflected by the heat reflector; and   a second regulator configured to regulate a temperature of the heat-radiating member.   
     
     
         6 . The processing apparatus according to  claim 5 , wherein the through hole is a hollow circular cylinder, and
 wherein the structural member includes a bundle of the circular cylinders.   
     
     
         7 . The processing apparatus according to  claim 5 , wherein the structural member has a flow path for a medium, and
 wherein the first regulator is configured to cause the medium whose temperature is regulated to flow via the flow path.   
     
     
         8 . The processing apparatus according to  claim 5 , further comprising a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate,
 wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel.   
     
     
         9 . A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel;   a structural member;   a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel;   a first regulator configured to regulate a temperature of the structural member,   wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction;   a heat reflector arranged in the exhaust vessel so as to be separated from and so as to face the structural member in the second direction;   a heat-radiating member arranged in the exhaust vessel so as to receive heat reflected by the heat reflector; and   a second regulator configured to regulate a temperature of the heat-radiating member.   
     
     
         10 . The processing apparatus according to  claim 9 , wherein the through hole is a hollow circular cylinder, and
 wherein the structural member includes a bundle of the circular cylinders.   
     
     
         11 . The processing apparatus according to  claim 9 , wherein the structural member has a flow path for a medium, and
 wherein the first regulator is configured to cause the medium whose temperature is regulated to flow via the flow path.   
     
     
         12 . The processing apparatus according to  claim 9 , further comprising a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate,
 wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel.   
     
     
         13 . A method of manufacturing a device, the method comprising:
 exposing a substrate to radiant energy to transfer a pattern to the substrate using a processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the processing apparatus including:   an exhaust device configured to exhaust a gas from the vacuum vessel, the exhaust device including:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust device is configured such that the vacuum pump exhausts a gas via the through hole; 
   a heat reflector arranged in the vacuum vessel so as to be separated from and so as to face the second end face;   a heat-radiating member arranged in the vacuum vessel so as to receive heat reflected by the heat reflector; and   a second regulator configured to regulate a temperature of the heat-radiating member;   developing the exposed substrate; and   processing the developed substrate to manufacture the device.   
     
     
         14 . A method of manufacturing a device, the method comprising:
 exposing a substrate to radiant energy to transfer a pattern to the substrate using a processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the processing apparatus including:   an exhaust vessel connected to the vacuum vessel;   an exhaust device connected to the exhaust vessel and configured to exhaust a gas from the vacuum vessel, the exhaust device including:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust device is configured such that the vacuum pump exhausts a gas via the through hole; 
   a heat reflector arranged in the exhaust vessel so as to be separated from and so as to face the second end face;   a heat-radiating member arranged in the exhaust vessel so as to receive heat reflected by the heat reflector; and   a second regulator configured to regulate a temperature of the heat-radiating member;   developing the exposed substrate; and   processing the developed substrate to manufacture the device.   
     
     
         15 . A method of manufacturing a device, the method comprising:
 exposing a substrate to radiant energy to transfer a pattern to the substrate using a processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus including:   an exhaust vessel connected to the vacuum vessel;   a structural member;   a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel;   a first regulator configured to regulate a temperature of the structural member,   wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction;   a heat reflector arranged in the exhaust vessel so as to be separated from and so as to face the structural member in the second direction;   a heat-radiating member arranged in the exhaust vessel so as to receive heat reflected by the heat reflector; and
 a second regulator configured to regulate a temperature of the heat-radiating member; 
   developing the exposed substrate; and   processing the developed substrate to manufacture the device.   
     
     
         16 . The processing apparatus according to  claim 1 , wherein the heat reflector is configured to reflect heat from the vacuum pump toward a direction, different from a direction toward the object, in which the heat-radiating member is arranged. 
     
     
         17 . The processing apparatus according to  claim 1 , wherein the heat reflector has a curved reflective surface. 
     
     
         18 . The processing apparatus according to  claim 1 , wherein the first end face of the structural member has a curved surface.