Induction for thermochemical processes, and associated systems and methods

Abstract

Induction for thermochemical processes, and associated systems and methods. A method in accordance with a particular embodiment includes placing first and second substrates in a reactor, with each substrate having a surface facing toward the other. Method can further include directing a precursor gas into the reactor and activating an induction coil proximate to the facing surfaces of the substrates to dissociate the precursor gas. A constituent of the precursor gas is deposited on both the first and second surfaces, and heat radiated from each surface and/or a constituent deposited on the surface is received at the other surface and/or the constituent deposited on the other surface.

1 - 20 . (canceled) 
     
     
         21 . A reactor system for forming a material, comprising:
 a reactor vessel having a reaction zone;   an induction coil positioned around the reaction zone;   a reactant supply coupled in fluid communication with the reaction zone;   a first substrate support positioned at the reaction zone to support a first substrate having a first surface;   a second substrate support positioned at the reaction zone to support a second substrate having a second surface facing toward the first surface of the first substrate;   a first insulator positioned at least proximate to the first substrate support, with at least one of the first substrate support and the first insulator positioned to insulate otherwise exposed surfaces of the first substrate, other than the first surface; and   a second insulator positioned at least proximate to the second substrate support, with at least one of the second substrate support and the second insulator positioned to insulate otherwise exposed surfaces of the second substrate, other than the second surface.   
     
     
         22 . The system of  claim 21 , further comprising:
 a first seal positioned to allow the first support to be withdrawn from the reaction zone while the induction coil is active and the reactant supply is delivering reactant to the reaction zone; and   a second seal positioned to allow the second support to be withdrawn from the reaction zone while the induction coil is active and the reactant supply is delivering reactant to the reaction zone.   
     
     
         23 . The system of  claim 22  wherein at least one of the first and second seals includes a labyrinth seal. 
     
     
         24 . The system of  claim 22 , further comprising:
 a first heat exchanger positioned proximate to the vessel to receive the first support as the first support is withdrawn from the reaction zone;   a second heat exchanger positioned proximate to the vessel to receive the second support as the second support is withdrawn from the reaction zone;   a third heat exchanger positioned between the reactant supply and the reaction zone; and   a heat exchanger fluid path coupled among the first, second and third heat exchangers to transfer heat received at the first and second heat exchangers to a reactant at the third heat exchanger.   
     
     
         25 . The system of  claim 24  wherein the reactor vessel includes an exit port positioned to receive gaseous constituents from within the vessel, and wherein the system further comprises:
 a product flow path coupled between the exit port and the third heat exchanger to transfer heat from the gaseous constituents to the reactant at the third heat exchanger. 
 
     
     
         26 . The system of  claim 21  wherein the reactor vessel includes an exit port positioned to receive gaseous constituents from within the vessel, and wherein the system further comprises:
 a separator coupled to the exit port and positioned to separate hydrogen from other constituents passing through the exit port. 
 
     
     
         27 . The system of  claim 21  wherein the reactor vessel includes an exit port positioned to receive gaseous constituents from within the vessel, and wherein the system further comprises:
 a separator coupled to the exit port and positioned to separate hydrogen having a first level of purity from hydrogen having a second level of purity less than the first. 
 
     
     
         28 . The system of  claim 21 , further comprising the first and second substrates. 
     
     
         29 . The system of  claim 28  wherein at least one of the first and second substrates includes carbon. 
     
     
         30 . The system of  claim 28 , further comprising a reactant carried by the reactant supply, and wherein the reactant and at least one of the first and second substrates have a common constituent. 
     
     
         31 . The system of  claim 21 , further comprising a controller coupled to the reactor vessel. 
     
     
         32 . The system of  claim 21  wherein the first and second substrate supports are movable toward and away from each other. 
     
     
         33 . The system of  claim 32  wherein the first and second substrate supports move as a function of an amount of material applied to the first and second substrates in the reaction zone. 
     
     
         34 . A reactor system for forming a material, comprising:
 a reactor vessel having a reaction zone;   an induction coil positioned around the reaction zone;   a reactant supply coupled in fluid communication with the reaction zone;   a first substrate support positioned at the reaction zone to support a first substrate having a first surface; and   a second substrate support positioned at the reaction zone to support a second substrate having a second surface facing toward the first surface of the first substrate, wherein at least one of the first and second substrate supports is movable away from the other to withdraw a corresponding one of the first and second substrates away from the other.   
     
     
         35 . The system of  claim 34 , further comprising:
 a first insulator positioned at least proximate to the first substrate support, with at least one of the first substrate support and the first insulator positioned to insulate otherwise exposed surfaces of the first substrate, other than the first surface; and   a second insulator positioned at least proximate to the second substrate support, with at least one of the second substrate support and the second insulator positioned to insulate otherwise exposed surfaces of the second substrate, other than the second surface.   
     
     
         36 . The system of  claim 34  wherein the at least one of the first and second substrate supports is movable away from the other as a function of the amount of material applied to the first and second substrates in the reaction zone. 
     
     
         37 . The system of  claim 34 , further comprising the first and second substrates. 
     
     
         38 . The system of  claim 37  wherein at least one of the first and second substrates includes carbon. 
     
     
         39 . The system of  claim 37 , further comprising a reactant carried by the reactant supply, and wherein the reactant and at least one of the first and second substrates have a common constituent. 
     
     
         40 . The system of  claim 34 , further comprising a controller coupled to the reactor vessel. 
     
     
         41 . The system of  claim 34 , further comprising:
 a first seal positioned to allow the first support to be withdrawn from the reaction zone while the induction coil is active and the reactant supply is delivering reactant to the reaction zone; and   a second seal positioned to allow the second support to be withdrawn from the reaction zone while the induction coil is active and the reactant supply is delivering reactant to the reaction zone.   
     
     
         42 . The system of  claim 41  wherein at least one of the first and second seals includes a labyrinth seal. 
     
     
         43 . The system of  claim 34 , further comprising:
 a first heat exchanger positioned proximate to the vessel to receive the first support as the first support is withdrawn from the reaction zone;   a second heat exchanger positioned proximate to the vessel to receive the second support as the second support is withdrawn from the reaction zone;   a third heat exchanger positioned between the reactant supply and the reaction zone; and   a heat exchanger fluid path coupled among the first, second and third heat exchangers to transfer heat received at the first and second heat exchangers to a reactant at the third heat exchanger.   
     
     
         44 . The system of  claim 43  wherein the reactor vessel includes an exit port positioned to receive gaseous constituents from within the vessel, and wherein the system further comprises:
 a product flow path coupled between the exit port and the third heat exchanger to transfer heat from the gaseous constituents to the reactant at the third heat exchanger. 
 
     
     
         45 . The system of  claim 34  wherein the reactor vessel includes an exit port positioned to receive gaseous constituents from within the vessel, and wherein the system further comprises:
 a separator coupled to the exit port and positioned to separate hydrogen from other constituents passing through the exit port. 
 
     
     
         46 . The system of  claim 34  wherein the reactor vessel includes an exit port positioned to receive gaseous constituents from within the vessel, and wherein the system further comprises:
 a separator coupled to the exit port and positioned to separate hydrogen having a first level of purity from hydrogen having a second level of purity less than the first.