Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same

Abstract

A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.

What is claimed is: 
     
         1 . A photoresist composition comprising:
 about 65 percent by weight to about 80 percent by weight of a mono-functional monomer;   about 5 percent by weight to about 20 percent by weight of a di-functional monomer;   about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups;   about 1 percent by weight to about 5 percent by weight of a photoinitiator; and   less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition.   
     
     
         2 . The photoresist composition of  claim 1 , wherein the mono-functional monomer comprises at least one selected from glycidyl acrylate, glycidyl methacrylate, hydroxyethyl methacrylate, 2-hydroxy-3-phenoxy-propyl acrylate, diethylene methylether methacrylate, hydroxyethyl acrylate, butyl methacrylate, hydroxypropyl acrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, 3,3,5-trimethylcyclohexyl methacrylate, isobornyl acrylate, isobornyl methacrylate, isodecyl acrylate, isodecyl methacrylate, isooctyl acrylate, lauryl acrylate, stearyl acrylate, tetrahydrofurfuryl acrylate and tridecyl acrylate. 
     
     
         3 . The photoresist composition of  claim 1 , wherein the di-functional monomer includes at least one selected from 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, ethyleneglycol dimethacrylate, diethylene dimethacrylate, 1,1,2-dodecanediol dimethacrylate, 1,4-butanediol dimethacrylate, neopentylglycol diacrylate, diethylene diacrylate, dipropyleneglycol diacrylate, bisphenol A diacrylate, bisphenol A dimethacrylate, ethyleneglycol diacrylate, tetraethyleneglycol diacrylate, tricyclodecanedimethanol diacrylate and triethyleneglycol diacrylate. 
     
     
         4 . The photoresist composition of  claim 1 , wherein the multi-functional monomer includes at least one selected from pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylpropane triacrylate, trimethylpropane trimethaacrylate, grycerol triacrylate, tri(2-hydroxyethyl)isocyanurate triacrylate, di-trimethylpropane tetraacrylate, dipentaerythritol pentaacrylate and pentaerythritol tetraacrylate. 
     
     
         5 . The photoresist composition of  claim 1 , wherein the photoinitiator includes at least one selected from 2-benzyl-2-(dimethylamino)-1-[4-(morpholinyl)phenyl]-1-butanone, phenyl bis(2,4,6-trimethyl)benzoyl and 1-hydroxycyclohexyl phenylketone. 
     
     
         6 . The photoresist composition of  claim 1 , wherein the surfactant comprises at least one selected from a silicone surfactant and a fluoride surfactant. 
     
     
         7 . A method of forming a polarizer, the method comprising:
 providing a reflective layer on a base substrate;   coating a photoresist composition on the reflective layer to form a photoresist coating layer, the photoresist composition comprising:
 about 65 percent by weight to about 80 percent by weight of a mono-functional monomer, 
 about 5 percent by weight to about 20 percent by weight of a di-functional monomer, 
 about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups, 
 about 1 percent by weight to about 5 percent by weight of a photoinitiator, and 
 less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition; 
   contacting the photoresist coating layer with a stamp having a wire grid shape to pattern the photoresist coating layer;   curing the patterned photoresist coating layer to form a photoresist pattern having the wire grid shape;   removing the stamp from the photoresist pattern having the wire grid shape; and   etching the reflective layer using the photoresist pattern as a mask to form a wire grid pattern to form the polarizer.   
     
     
         8 . The method of  claim 7 , wherein the reflective layer comprises a metal layer, and a protective layer on the metal layer. 
     
     
         9 . The method of  claim 8 , wherein the metal layer comprises at least one selected from nickel, aluminum, titanium, silver and chrome. 
     
     
         10 . The method of  claim 8 , wherein the protective layer comprises at least one selected from a silicon nitride and a silicon oxide. 
     
     
         11 . The method of  claim 7 ,
 wherein the mono-functional monomer includes at least one selected glycidyl acrylate, glycidyl methacrylate, hydroxyethyl methacrylate, 2-hydroxy-3-phenoxy-propyl acrylate, diethylene methylether methacrylate, hydroxyethyl acrylate, butyl methacrylate, hydroxypropyl acrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, 3,3,5-trimethylcyclohexyl methacrylate, isobornyl acrylate, isobornyl methacrylate, isodecyl acrylate, isodecyl methacrylate, isooctyl acrylate, lauryl acrylate, stearyl acrylate, tetrahydrofurfuryl acrylate and tridecyl acrylate,   wherein the di-functional monomer includes at least one selected from 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, ethyleneglycol dimethacrylate, diethylene dimethacrylate, 1,1,2-dodecanediol dimethacrylate, 1,4-butanediol dimethacrylate, neopentylglycol diacrylate, diethylene diacrylate, dipropyleneglycol diacrylate, bisphenol A diacrylate, bisphenol A dimethacrylate, ethyleneglycol diacrylate, tetraethyleneglycol diacrylate, tricyclodecanedimethanol diacrylate and triethyleneglycol diacrylate, and   wherein the multi-functional monomer includes at least one selected from pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylpropane triacrylate, trimethylpropane trimethacrylate, grycerol triacrylate, tri(2-hydroxyethyl)isocyanurate triacrylate, di-trimethylpropane tetraacrylate, dipentaerythritol pentaacrylate and pentaerythritol tetraacrylate.   
     
     
         12 . The method of  claim 7 , wherein the curing the patterned photoresist coating layer comprises irradiating an ultraviolet light onto the patterned photoresist coating layer. 
     
     
         13 . The method of  claim 7 , wherein the photoresist pattern comprises:
 a first portion having a first thickness, and a second portion having a second thickness less than the first thickness, and   the method further comprises removing the second portion of the photoresist pattern to expose a portion of the reflective layer, before the etching the reflective layer.   
     
     
         14 . The method of  claim 13 , wherein the removing the second portion of the photoresist pattern comprises applying a plasma to an entire of the photoresist pattern. 
     
     
         15 . A method of manufacturing a display substrate, the method comprising:
 providing a reflective layer on a base substrate;   coating a photoresist composition on the reflective layer to form a photoresist coating layer, the photoresist composition comprising
 about 65 percent by weight to about 80 percent by weight of a mono-functional monomer, 
 about 5 percent by weight to about 20 percent by weight of a di-functional monomer, 
 about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups, 
 about 1 percent by weight to about 5 percent by weight of a photoinitiator, and 
 less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition; 
   contacting the photoresist coating layer with a stamp having a wire grid shape to pattern the photoresist coating layer;   curing the patterned photoresist coating layer to form a photoresist pattern having the wire grid shape;   removing the stamp from the photoresist pattern having the wire grid shape;   etching the reflective layer using the photoresist pattern as a mask to form a wire grid pattern;   providing a planarizing protecting film on the wire grid pattern; and   providing a switching element array on the planarizing protecting film to manufacture the display substrate.   
     
     
         16 . The method of  claim 15 , wherein the reflective layer comprises a metal layer and a protective layer on the metal layer. 
     
     
         17 . The method of  claim 16 , wherein the metal layer comprises at least one selected from nickel, aluminum, titanium, silver and chrome. 
     
     
         18 . The method of  claim 16 , wherein the protective layer includes at least one selected from a silicon nitride and a silicon oxide. 
     
     
         19 . The method of  claim 15 ,
 wherein the mono-functional monomer includes at least one selected glycidyl acrylate, glycidyl methacrylate, hydroxyethyl methacrylate, 2-hydroxy-3-phenoxy-propyl acrylate, diethylene methylether methacrylate, hydroxyethyl acrylate, butyl methacrylate, hydroxypropyl acrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, 3,3,5-trimethylcyclohexyl methacrylate, isobornyl acrylate, isobornyl methacrylate, isodecyl acrylate, isodecyl methacrylate, isooctyl acrylate, lauryl acrylate, stearyl acrylate, tetrahydrofurfuryl acrylate and tridecyl acrylate,   wherein the di-functional monomer includes at least one selected from 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, ethyleneglycol dimethacrylate, diethylene dimethacrylate, 1,1,2-dodecanediol dimethacrylate, 1,4-butanediol dimethacrylate, neopentylglycol diacrylate, diethylene diacrylate, dipropyleneglycol diacrylate, bisphenol A diacrylate, bisphenol A dimethacrylate, ethyleneglycol diacrylate, tetraethyleneglycol diacrylate, tricyclodecanedimethanol diacrylate and triethyleneglycol diacrylate, and   wherein the multi-functional monomer includes at least one selected from pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylpropane triacrylate, trimethylpropane trimethacrylate, grycerol triacrylate, tri(2-hydroxyethyl)isocyanurate triacrylate, di-trimethylpropane tetraacrylate, dipentaerythritol pentaacrylate and pentaerythritol tetraacrylate.   
     
     
         20 . A method of manufacturing a display substrate, the method comprising:
 providing a reflective layer on a first surface of a base substrate;   coating a photoresist composition on the reflective layer to form a photoresist coating layer, the photoresist composition comprising
 about 65 percent by weight to about 80 percent by weight of a mono-functional monomer; 
 about 5 percent by weight to about 20 percent by weight of a di-functional monomer; 
 about 1 percent by weight to about 10 percent by weight of a multi-functional monomer comprising three or more functional groups; 
 about 1 percent by weight to about 5 percent by weight of a photoinitiator; and 
 less than about 1 percent by weight of a surfactant, each based on a total weight of the photoresist composition; 
   contacting the photoresist coating layer with a stamp having a wire grid shape to pattern the photoresist coating layer;   curing the patterned photoresist coating layer to form a photoresist pattern having the wire grid shape;   removing the stamp from the photoresist pattern having the wire grid shape;   etching the reflective layer using the photoresist pattern as a mask to form a wire grid pattern;   providing a planarizing protecting film on the wire grid pattern; and   providing a switching element array on a second surface opposite to the first surface of the base substrate to manufacture the display substrate.