Carrier head for chemical mechanical polishing system

Abstract

Disclosed herein is a carrier head for a chemical mechanical polishing system. The carrier head for a chemical mechanical polishing system includes a base. A substrate receiving member having an outer surface against which a substrate can be mounted is connected to a lower part of the base. Inside of the substrate receiving member, at least two bladders are connected to the lower part of the base. The at least two bladders can apply pressure independently to predetermined areas of an inner surface of the substrate receiving member by expanding and contacting the inner surface. At least one wall structure is connected to the lower part of the base, wherein the at least one wall structure can limit lateral expansions of the at least two bladders.

What is claimed is: 
     
         1 . A carrier head for a chemical mechanical polishing system, comprising:
 a base;   a substrate receiving member connected to a lower part of the base, having an outer surface against which a substrate can be mounted;   at least two bladders positioned inside of the substrate receiving member and connected to the lower part of the base, wherein the at least two bladders can apply pressure independently to predetermined areas of an inner surface of the substrate receiving member by expanding and contacting the inner surface; and   at least one wall structure connected to the lower part of the base, wherein the at least one wall structure can limit lateral expansions of the at least two bladders.   
     
     
         2 . The carrier head of  claim 1 , wherein the substrate receiving member comprises a plate portion, a perimeter portion, and a securing portion. 
     
     
         3 . The carrier head of  claim 2 , wherein the plate portion comprises a first plate and a second plate attached to an upper surface of the first plate. 
     
     
         4 . The carrier head of  claim 3 , wherein the second plate is formed of a material having a higher stiffness than that of the first plate. 
     
     
         5 . The carrier head of  claim 1 , wherein the predetermined areas can be partitioned into a center area and an edge area of the inner surface, and an intermediate area between the center area and the edge area. 
     
     
         6 . The carrier head of  claim 1 , wherein the numbers of the at least two bladders are from 2 to 12. 
     
     
         7 . The carrier head of  claim 1 , wherein the at least two bladders are formed of a flexible material. 
     
     
         8 . The carrier head of  claim 7 , wherein the flexible material is a rubber. 
     
     
         9 . The carrier head of  claim 1 , wherein the at least two bladders are respectively connected to the lower part of the base by at least one bladder clamp. 
     
     
         10 . The carrier head of  claim 9 , wherein the at least one bladder clamp and the at least one wall structure are integrally formed in one body. 
     
     
         11 . The carrier head of  claim 1 , wherein the at least two bladders are connected to the lower part of the base by fastening a connecting member to the base after the at least two bladders are clamped to the connecting member. 
     
     
         12 . The carrier head of  claim 1 , further comprising a wall structure that can limit a contact between a perimeter portion of the substrate receiving member and a bladder located over an edge area of the inner surface among the at least two bladders. 
     
     
         13 . The carrier head of  claim 1 , wherein securing portions of a bladder located over an edge area of the inner surface among the at least two bladders extend outwardly. 
     
     
         14 . The carrier head of  claim 1 , wherein the at least one wall structure is connected to the lower part of the base by fastening a connecting member to the base after the at least one wall structure is clamped to the connecting member. 
     
     
         15 . The carrier head according to  claim 14 , wherein the at least one wall structure and the connecting member are integrally formed in one body. 
     
     
         16 . The carrier head of  claim 1 , wherein the at least one wall structure can further limit a contact between two adjacent bladders among the at least two bladders. 
     
     
         17 . A carrier head for a chemical mechanical polishing system, comprising:
 a base;   a substrate receiving member connected to a lower part of the base, having an outer surface against which a substrate can be mounted;   a bladder positioned inside of the substrate receiving member and connected to the lower part of the base, wherein the bladder can apply pressure to a predetermined area of an inner surface of the substrate receiving member by expanding and contacting the inner surface; and   at least one wall structure connected to the lower part of the base, wherein the at least one wall structure can limit a lateral expansion of the bladder.   
     
     
         18 . A substrate receiving member used in a carrier head for a chemical mechanical polishing system, comprising:
 a plate portion providing an outer surface for receiving a substrate;   a vertical perimeter portion extending from the plate portion, wherein the vertical perimeter portion forms an angle of 84° to 96° with respect to the plate portion; and   an inclined perimeter portion extending from the vertical perimeter portion, wherein the inclined perimeter portion extends outwardly forming an angle of 6° to 40° with respect to the vertical perimeter portion.   
     
     
         19 . The substrate receiving member of  claim 18 , wherein the vertical perimeter portion is stiffer than the inclined perimeter portion.