Showerhead for cvd depositions

Abstract

A CVD showerhead that includes a circular inner showerhead and at least one outer ring showerhead. At least two process gas delivery tubes are coupled to each showerhead. Also, a dual showerhead that includes a circular inner showerhead and at least one outer ring showerhead where each showerhead is coupled to oxygen plus a gas mixture of lead, zirconium, and titanium organometallics. A method of depositing a CVD thin film on a wafer. Also, a method of depositing a PZT thin film on a wafer.

What is claimed is: 
     
         1 . A process of depositing a CVD thin film, comprising:
 supplying a non-reacting process gas mixture to a mixing chamber of a showerhead through a first process gas delivery tube; and   supplying a reactant gas to said mixing chamber through a second process gas delivery tube.   
     
     
         2 . The process of  claim 1  where said non-reacting process gas mixture is a mixture of a lead organometallic, a zirconium organometallic, and a titanium organometallic and where said reactant gas is oxygen. 
     
     
         3 . A process of depositing a CVD thin film, comprising:
 supplying a non-reacting process gas mixture to a first chamber of a showerhead; and   supplying a reactant gas to a second chamber of said showerhead.