US2013240350A1PendingUtilityA1

Electronic device housing and method for making the same

Assignee: SHENZHEN FUTAIHONG PREC IND COPriority: Dec 28, 2009Filed: May 14, 2013Published: Sep 19, 2013
Est. expiryDec 28, 2029(~3.4 yrs left)· nominal 20-yr term from priority
C03C 17/2456C04B 41/009C03C 2217/212C04B 2111/2061C04B 2111/00853Y10T428/2495C09D 5/00C04B 41/87H05K 5/0243C04B 41/52Y10T428/131Y10T428/1317C04B 41/89Y10T428/265C03C 2217/71B82Y 99/00C23C 14/083C04B 41/5041C03C 2218/155
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Claims

Abstract

An electronic device housing includes a substrate and a nano titanium dioxide coating formed on the substrate. The nano titanium dioxide coating has a thickness of about 10-100 nm. The nano titanium dioxide coating is formed of rutile crystals or composite crystals formed of rutile and anatase. A method for making the electronic device is also described.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method for making electronic device housing, comprising:
 providing a substrate;   vacuum sputtering a nano titanium dioxide coating on the substrate, the nano titanium dioxide coating being formed of rutile crystals or composite crystals formed of rutile and anatase, and having a thickness of about 10 nm to about 100 nm.   
     
     
         2 . The method as claimed in  claim 1 , wherein vacuum sputtering the nano titanium dioxide coating is carried out by using oxygen gas and argon gas, the oxygen gas and the argon gas having a total pressure of about 0.05 Pa to about 0.29 Pa. 
     
     
         3 . The method as claimed in  claim 2 , wherein the oxygen gas has a pressure of about 0.01 Pa to about 0.225 Pa. 
     
     
         4 . The method as claimed in  claim 1 , wherein vacuum sputtering the nano titanium dioxide coating is carried out by using a titanium target, the titanium target is set with an output power of about 3000 W to about 4000 W. 
     
     
         5 . The method as claimed in  claim 1 , wherein the nano titanium dioxide coating is vacuum sputtered at a rate of about 0.3 nm/s to about 0.5 nm/s. 
     
     
         6 . The method as claimed in  claim 1 , further comprising a step of spraying a base paint coating on the substrate before forming the nano titanium dioxide coating. 
     
     
         7 . The method as claimed in  claim 6 , wherein spraying the base paint coating is carried out by using acrylic resin paint, epoxy resin paint, polyurethane resin paint, or phenolic resin paint. 
     
     
         8 . The method as claimed in  claim 6 , wherein the base paint coating has a thickness of about 1 μm to about 30 μm.

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