US2013239885A1PendingUtilityA1
Film formation mask
Est. expiryAug 17, 2030(~4.1 yrs left)· nominal 20-yr term from priority
Inventors:Tetsuya Karaki
C23C 14/042C23C 16/042H05B 33/10H10K 71/166H10K 59/35H10K 2102/00
65
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Claims
Abstract
Provided is a film formation mask capable of preventing slit-like openings from being closed by vibrations so as to form a highly precise patterned film with stability. In a film formation mask formed by providing multiple slit-like openings in a metal foil, the shape of the opening of at least one end of the slit-like openings is asymmetrical with respect to a center line of the width direction of the slit-like openings.
Claims
exact text as granted — not AI-modified1 . A film formation mask, comprising a metal foil fixed to a frame body with stronger tension applied to the metal foil in one direction than in another direction, wherein:
the metal foil includes slit-like openings elongated in the one direction, which are repeatedly provided in a short side direction of the slit-like openings; and a shape of at least one end of each of the slit-like openings is asymmetrical with respect to a center line of a short side of the slit-like openings.
2 . The film formation mask according to claim 1 , wherein shapes of both ends of the slit-like openings are asymmetrical with respect to the center line of the short side of the slit-like openings and symmetrical with respect to a center line of a long side of the slit-like openings.
3 . (canceled)Join the waitlist — get patent alerts
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