Apparatus for wet etching while forming interconnect trench in insulating film

Abstract

A wet etching method that includes forming an insulating film on a substrate, and irradiating laser light to the insulating film during wet etching of the insulating film using an etching solution.

What is claimed is: 
     
         1 . A wet etching apparatus, comprising:
 an immersion tank for immersing of a substrate formed on an insulating film in etching solution or a spraying device for spraying of etching solution onto the substrate formed on the insulating film; and   a laser light irradiation device for irradiating of laser light to the substrate during wet etching of the insulating film.   
     
     
         2 . The wet etching apparatus according to  claim 1 , further comprising:
 a lens,   wherein the laser light is irradiated to the insulating film through the lens.   
     
     
         3 . The wet etching apparatus according to  claim 2 ,
 wherein the laser light is irradiated to the insulating film under the condition that the lens contacts the etching solution.   
     
     
         4 . The wet etching apparatus according to  claim 1 ,
 wherein a wavelength of the laser light is in the range of 150 nm to 400 nm.