Method of self-aligned fully integrated stck fabrication

Abstract

The embodiments disclose a method of self-aligned fully integrated stack fabrication that includes writing fully integrated self-aligned data and servo two dimensional low-frequency guiding patterns that include encoded servo-information to create various types of self-assembly low-frequency guiding structures, guiding high density self-assembly processes using the low-frequency guiding structures to create high density data and servo fields and etching the high density data and servo fields and low-frequency encoded servo-information into a template substrate to create fully integrated stack master templates to use in the fabrication of stacks such as bit patterned media.

What is claimed is: 
     
         1 . A method of self-aligned fully integrated stack fabrication, comprising:
 writing fully integrated self-aligned data and servo two dimensional low-frequency guiding patterns that include encoded servo-information and configured to create various types of self-assembly low-frequency guiding structures;   guiding high density self-assembly processes using the low-frequency guiding structures and configured to create high density data and servo fields; and   etching the high density data and servo fields and low-frequency encoded servo-information into a template substrate and configured to create fully integrated stack master templates.   
     
     
         2 . The method of  claim 1 , wherein the self-assembly low-frequency guiding structures include various types of structures such as hexagonal close packed and square guiding structures and configured to create low-frequency data and servo fields. 
     
     
         3 . The method of  claim 2 , wherein servo-field low-frequency guiding structures are larger than data-field low-frequency guiding structures and are configured to be compatible with self-assembly long-range order natural patterns. 
     
     
         4 . The method of  claim 1 , further comprising depositing a resist layer on an image layer deposition on the template substrate and imprinting the resist layer with the self-aligned fully integrated data and servo two dimensional low-frequency guiding patterns. 
     
     
         5 . The method of  claim 1 , wherein various low-frequency patterned self-assembly guiding structures created in the imprinted resist layer are transferred to the image layer using transfer processes such as a wet reverse-tone process and a dry reverse-tone process. 
     
     
         6 . The method of  claim 1 , wherein the image layer deposition onto the template substrate is configured to include single layer and multi-layered image layers using materials such as chromium and amorphous carbon. 
     
     
         7 . The method of  claim 1 , further comprising using a direct-etch process to transfer directly into the image layer the self-aligned fully integrated data and servo two dimensional low-frequency guiding patterns. 
     
     
         8 . The method of  claim 1 , wherein the guided self-assembly process includes using various self-assembling agents such as poly styrene-poly dimethylsiloxane (PS-PDMS), polystyrene polymethyl methacrylate (PS-PMMA), polystyrene-polyethylene oxide (PS-PEO) and any other suitable self-aligning agents. 
     
     
         9 . The method of  claim 8 , wherein the high density self-assembly process creates a high-frequency background on the image layer enabling effective planarization. 
     
     
         10 . The method of  claim 1 , wherein the template substrate includes the use of materials such as quartz and silicon. 
     
     
         11 . The method of  claim 1 , wherein etching the high density data and servo fields and low-frequency encoded servo-information into the template substrate is a single process avoiding overlays and includes the use of e-beam lithography. 
     
     
         12 . The method of  claim 1 , further comprising using various combinations of processes such as e-beam lithography, guided self-assembly processes and direct-etch processes using the two dimensional low-frequency guiding patterns to create a fully integrated stack fabrication master template. 
     
     
         13 . An apparatus, comprising:
 means for writing self-aligned data and servo two dimensional low-frequency guiding patterns that includes encoded servo-information; and   means for fully integrating various compatible two dimensional low-frequency self-assembly guiding structures created using the self-aligned data and servo two dimensional low-frequency guiding patterns, wherein the fully integrated compatible two dimensional low-frequency self-assembly guiding structures are used in processes to pattern stack master-templates.   
     
     
         14 . The apparatus of  13 , further comprising means wherein the low-frequency data-field guiding patterns are written to create natural patterned guiding structures such as sparse hexagonal and wherein the low-frequency servo-field guiding patterns are written to create guiding structures compatible with the low-frequency data-field natural patterned guiding structures. 
     
     
         15 . The apparatus of  13 , further comprising means for encoding servo-information into the low-frequency large servo-field guiding pattern structures. 
     
     
         16 . The apparatus of  13 , further comprising means for concurrent etching of the low-frequency data-field patterns and low-frequency large servo-field guiding patterns into a single nano-imprint template. 
     
     
         17 . A fully integrated stack patterning system, comprising:
 compatible fully integrated self-aligned data and servo two dimensional low-frequency guiding patterns written and configured to include encoded servo-information;   various types of compatible self-assembly low-frequency guiding structures created using the two dimensional low-frequency guiding patterns; and   high density data and servo field structures created using a self-assembly process guided by the low-frequency guiding structures, together with the low-frequency encoded servo-information structures are etched into a substrate and configured to create a patterned fully integrated stack fabrication master template.   
     
     
         18 . The fully integrated stack patterning system of  claim 17 , wherein the data two dimensional low-frequency guiding patterns include natural patterns configured to create low-frequency data guiding structures such as sparse hexagonal guiding structures. 
     
     
         19 . The fully integrated stack patterning system of  claim 17 , wherein the servo two dimensional low-frequency guiding patterns are configured to create low-frequency servo guiding structures that are larger than and compatible with the natural patterns of the low-frequency data guiding structures. 
     
     
         20 . The fully integrated stack patterning system of  claim 17 , wherein the high density data and servo field structures including the low-frequency encoded servo-information structures are planarized.