Method and device for producing rod lenses

Abstract

A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of at least 800 mm. The method is characterized in that fabrication is performed from a cylindrical rod lens element made from synthetic quartz glass material configured as a fused silica ingot. This is performed using a flame hydrolysis method with a direct one stage deposition process of SIO x particles from a flame stream onto die that rotates and is moveable in a linear manner with respect to the flame stream.

What is claimed is: 
     
         1 . A method for producing rod lenses with an enveloping diameter of the rod lens face of up to 200 mm and an edge length of essentially 800 mm through fabrication from a cylindrical element made from synthetic quartz glass material configured as a fused silica ingot based on a flame hydrolysis method with direct one stage deposition process of SIO particles from a flame stream onto a rotating die that is moveable in a linear manner with respect to the flame stream. 
     
     
         2 . The method according to  claim 1 , wherein the synthetic quartz glass material amount deposited in the deposition process has an OH content of more than 1,000 ppm and/or a H 2  content of more than 0.8×10 18  molecules/cm 3 , typically 1.2×10 18  molecules/cm 3 . 
     
     
         3 . The method according to  claim 1 , wherein the synthetic quartz glass material amount deposited in the deposition process has maximum transmissivity for ultra violet radiation in the wave length range of 193-400 nm. 
     
     
         4 . A method for producing a cylindrical element that is configured for producing a rod lens, comprising depositing using a direct single stage flame hydrolysis deposition process SIO x  particles from a flame stream onto a rotating and moveable die. 
     
     
         5 . A device for producing a rod lens base element with cylindrical shape including a muffle oven with a multi shell tube- or tunnel shaped muffle, a burner inserted on a first side into the muffle with a feed line for a reaction agent including silicon and a die that is moveable on a second side of the muffle that is arranged opposite to the burner, wherein the muffle includes a muffle geometry with a distance (a) between the enveloping surface of the forming base element and the inner wall of the muffle in a range of 40-75 mm and a distance (b) between the muffle and the melting surface of the base element of 10-25 mm and an exhaust air controlled kiln temperature of 1,100-1,300° C. is provided in the muffle. 
     
     
         6 . The device according to  claim 5 , wherein the muffle includes a temperature stabilizing oven cavity extension with a length of at least 50 mm. 
     
     
         7 . The method according to  claim 2 , wherein the synthetic quartz glass material amount deposited in the deposition process has maximum transmissivity for ultra violet radiation in the wave length range of 193-400 nm.