US2013136991A1PendingUtilityA1

High energy/power density nickel oxide/hydroxide materials and nickel cobalt oxide/hydroxide materials and production thereof

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Assignee: L LIVERMORE NAT SECURITY LLCPriority: Nov 30, 2011Filed: Nov 26, 2012Published: May 30, 2013
Est. expiryNov 30, 2031(~5.3 yrs left)· nominal 20-yr term from priority
Inventors:Matthew MerrillMichael Stadermann
H01M 10/30H01M 4/38H01M 4/32H01M 4/525Y10S977/755H01M 2220/30H01M 4/0452B82Y 30/00Y02E60/10H01M 4/366
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Claims

Abstract

According to one embodiment, a material includes a nickel oxide/hydroxide active film, wherein the nickel oxide/hydroxide active film has a physical characteristic of maintaining greater than about 80% charge over greater than 500 charge/discharge cycles, and wherein the nickel oxide/hydroxide active film has a physical characteristic of storing electrons at greater than about 0.5 electron per nickel atom.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A material, comprising:
 a nickel oxide/hydroxide active film, wherein the nickel oxide/hydroxide active film has a physical characteristic of maintaining greater than about 80% charge over greater than 500 charge/discharge cycles, and wherein the nickel oxide/hydroxide active film has a physical characteristic of storing electrons at greater than about 0.5 electron per nickel atom.   
     
     
         2 . The material of  claim 1 , wherein the nickel oxide/hydroxide active film has a thickness of about 20 to about 200 nm. 
     
     
         3 . The material of  claim 1 , wherein the nickel oxide/hydroxide active film has a deposition thickness that varies less than about ±1 nm along all codeposited portions thereof, wherein the thickness of the nickel oxide/hydroxide active film is in a range of about 50 to about 100 nm. 
     
     
         4 . The material of  claim 1 , wherein the nickel oxide/hydroxide film has a charge rate of greater than about 100 C per hour. 
     
     
         5 . The material of  claim 1 , wherein the nickel oxide/hydroxide film includes cobalt. 
     
     
         6 . The material of  claim 5 , wherein the nickel oxide/hydroxide active film has a physical characteristic of maintaining greater than about 90% charge over greater than about 800 cycles. 
     
     
         7 . The material of  claim 5 , wherein the nickel oxide/hydroxide active film comprises a cobalt (Co) to nickel (Ni) ratio of about 2:1 to about 1:2. 
     
     
         8 . The material of  claim 5 , wherein the nickel oxide/hydroxide active film is capable of a 100% depth of discharge at varying discharge rates. 
     
     
         9 . The material of  claim 1 , further comprising a substrate upon which the nickel oxide/hydroxide active film is deposited, wherein the substrate is porous. 
     
     
         10 . The material of  claim 1 , further comprising a substrate upon which the nickel oxide/hydroxide active film is deposited, wherein the substrate includes highly oriented paralytic graphite. 
     
     
         11 . The material of  claim 1 , further comprising a substrate upon which the nickel oxide/hydroxide active film is deposited, wherein the substrate includes nickel. 
     
     
         12 . A method for forming the material of  claim 1 , the method comprising: forming the nickel oxide/hydroxide active film onto a substrate from a solution including a nickelous salt and an electrolyte. 
     
     
         13 . The method of  claim 12 , wherein the nickelous salt is selected from a group consisting of: nickel acetate (NiAc), Ni(NO 3 ) 2 , NiSO 4 , and NiCl 2 . 
     
     
         14 . The method of  claim 12 , wherein the electrolyte is at least one of potassium acetate (KAc) and sodium acetate (NaAc). 
     
     
         15 . The method of  claim 12 , wherein the electrolyte is at least one of potassium fluoride (KF) and sodium fluoride (NaF). 
     
     
         16 . The method of  claim 12 , wherein the electrolyte is selected from a group consisting of: LiAc, NaAc, KAc, NaNO 3 , NaF, KF and Na 2 SO 4 . 
     
     
         17 . The method of  claim 12 , further comprising depositing the nickel oxide/hydroxide active film on a substrate via anodic electrodeposition. 
     
     
         18 . The method of  claim 12 , wherein the solution has a pH less than about 6. 
     
     
         19 . A battery, comprising:
 a cathode, comprising: a substrate having the nickel oxide/hydroxide active film of  claim 1  deposited thereon.   
     
     
         20 . The battery of  claim 19 , further comprising an anode and an electrolyte solution.

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