Extreme ultra violet light source apparatus

Abstract

An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.

1 - 14 . (canceled) 
     
     
         15 . An extreme ultraviolet light source apparatus comprising:
 a chamber;   a target supply unit configured to supply a target material, which is tin, into the chamber;   a gas supply unit configured to supply a hydrogen gas into the chamber;   a CO 2  laser configured to apply a laser beam to the target material supplied from the target supply unit to generate plasma from which extreme ultraviolet light is emitted, and excite the hydrogen gas and an electrically neutral tin both existing in the chamber to make the hydrogen gas and the tin chemically react with each other and generate a gaseous product;   a collector mirror configured to collect the extreme ultraviolet light from the plasma, in the chamber; and   an exhaust unit configured to exhaust the hydrogen gas and the gaseous product from the chamber.   
     
     
         16 . The extreme ultraviolet light source apparatus according to  claim 15 , wherein the gaseous product is SnH 4 . 
     
     
         17 . The extreme ultraviolet light source apparatus according to  claim 15 , wherein a surface of the collector mirror is coated with a protective film containing at least one of ruthenium (Ru), silicon carbide (SiC), carbon (C), silicon dioxide (SiO 2 ), and ruthenium oxide (RuO 2 ).