US2013122430A1PendingUtilityA1
Method of manufacturing printed circuit board for optical waveguide
Est. expiryDec 9, 2028(~2.4 yrs left)· nominal 20-yr term from priority
G02B 6/138H05K 3/28G02B 2006/12073H05K 1/0274H05K 2201/0187H05K 3/00Y10T29/49165G02B 6/10
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Claims
Abstract
A method of manufacturing a printed circuit board for an optical waveguide includes forming an insulation layer having a through hole on a substrate; forming a lower clad layer on a bottom of the through hole; forming a core part on the lower clad layer; and forming an upper clad layer covering the core part on the lower clad layer and the core part.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of manufacturing a printed circuit board for an optical waveguide, comprising:
forming an insulation layer having a through hole on a substrate; forming a lower clad layer on a bottom of the through hole; forming a core part on the lower clad layer; and forming an upper clad layer covering the core part on the lower clad layer and the core part.
2 . The method according to claim 1 , wherein the forming of the insulation layer having the through hole comprises:
forming an insulation layer on a substrate; and forming a through hole in the insulation layer through an exposure/development process or a laser drilling process.
3 . The method according to claim 1 , wherein the forming of the lower clad layer comprises:
applying a liquid lower clad material on a bottom of the through hole; flattening the applied lower clad material by placing a transparent release film thereon; and curing the flattened lower clad material by applying ultraviolet rays or heat thereto to form the lower clad layer on a bottom of the through hole.
4 . The method according to claim 1 , wherein the forming of the core part comprises:
applying a liquid core material on the lower clad layer formed in the through hole; flattening the applied core material by placing a transparent release film thereon; selectively exposing the flattened core material using a pattern mask; and removing the transparent release film and then developing the exposed core material to form the core part.
5 . The method according to claim 1 , wherein the forming of the core part comprises:
applying a liquid core material on the lower clad layer formed in the through hole; curing the applied core material by applying light or heat thereto; and patterning the cured core material using a laser to form the core part.
6 . The method according to claim 1 , wherein the forming of the upper clad layer is performed through a process of applying an upper clad material on the lower clad layer and the core part and then curing the applied upper clad material or a process of placing an upper clad film on the lower clad layer and the core part.
7 . The method according to claim 1 , wherein the substrate includes a polyimide layer and a metal layer formed beneath the polyimide layer, and
wherein the method further comprises: patterning the metal layer to form circuit patterns after the forming of the upper clad layer.
8 . A method of manufacturing a printed circuit board for an optical waveguide, comprising:
forming a lower insulation layer having a lower through hole on a substrate; forming a lower clad layer in the lower through hole; forming an upper insulation layer having an upper through hole connected with the lower through hole to thus form a single through hole on the lower insulation layer; forming core part on the lower clad layer; and forming an upper clad layer covering the core part on the lower clad layer and the core part.
9 . The method according to claim 8 , wherein the forming of the lower clad layer comprises:
applying a liquid lower clad material in the lower through hole; flattening the applied lower clad material by placing a transparent release film thereon; and curing the flattened lower clad material by applying ultraviolet rays or heat thereto to form the lower clad layer in the lower through hole.Join the waitlist — get patent alerts
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