Pattern shape evaluation method, pattern shape evaluation device, pattern shape evaluating data generation device and semiconductor shape evaluation system using the same

Abstract

A pattern shape evaluation method and semiconductor inspection system having a unit for extracting contour data of a pattern from an image obtained by photographing a semiconductor pattern, a unit for generating pattern direction data from design data of the semiconductor pattern, and a unit for detecting a defect of a pattern, through comparison between pattern direction data obtained from the contour data and pattern direction data generated from the design data corresponding to a pattern position of the contour data.

1 - 13 . (canceled) 
     
     
         14 . A pattern shape evaluation data generation device comprising:
 means for generating pattern shape range data from semiconductor design data;   means for displaying said pattern shape range data;   means for inputting data regarding a change in said pattern shape range data; and   means for updating said pattern shape range data in accordance with said data regarding a change.   
     
     
         15 . A pattern shape evaluation data generation device comprising:
 means for generating pattern direction data from one of semiconductor design data of the electronic device or from the image obtained by photographing the circuit pattern of the electronic device, or pattern shape data obtained through process simulation;   means for displaying said pattern direction data;   means for inputting data regarding a change in said pattern direction data; and   means for updating said pattern direction data in accordance with said data regarding a change.   
     
     
         16 . A pattern shape evaluation data generation device comprising:
 means for generating pattern direction data and pattern shape range data from one of semiconductor design data of the electronic device or from the image obtained by photographing the circuit pattern of the electronic device, or pattern shape data obtained through process simulation;   means for displaying said pattern direction data and said pattern shape range data;   means for inputting data regarding a change in said pattern direction data and said pattern shape range data; and   means for updating said pattern direction data and said pattern shape range data in accordance with said data regarding a change.   
     
     
         17 . The pattern shape evaluation data generation device according to  claim 14 , further comprising:
 means for inputting a parameter of data representative of anyone of a pattern width, a pattern direction, a diameter or radius of a circle pattern for forming a curve pattern, and a positional relation of apex coordinate circle patterns of said design data, to the pattern of said design data; and   means for generating said pattern shape range data from one of said design data of the electronic device or from the image obtained by photographing the circuit pattern of the electronic device, or pattern shape data obtained through process simulation by using said parameter.   
     
     
         18 . The pattern shape evaluation data generation device according to  claim 15 , further comprising:
 means for inputting a parameter of data representative of anyone of a pattern width, a pattern direction, a diameter or radius of a circle pattern for forming a curve pattern, and a positional relation of apex coordinate circle patterns of one of said design data of the electronic device or from the image obtained by photographing the circuit pattern of the electronic device, or pattern shape data obtained through process simulation, to the pattern of said design data; and   means for generating said pattern direction data from said design data by using said parameter.   
     
     
         19 . The pattern shape evaluation data generation device according to  claim 16 , further comprising:
 means for inputting a parameter of data representative of anyone of a pattern width, a pattern direction, a diameter or radius of a circle pattern for forming a curve pattern, and a positional relation of apex coordinate circle patterns of one of said design data of the electronic device or from the image obtained by photographing the circuit pattern of the electronic device, or pattern shape data obtained through process simulation, to the pattern of said design data; and   means for generating said pattern direction data and said pattern shape range data by using said parameter.   
     
     
         20 - 30 . (canceled)