Source gas supply unit, and deposition apparatus and method using the same

Abstract

Provided are a source gas supply unit capable of supplying a constant amount of source gas to a deposition chamber to deposit a uniform layer, and a deposition apparatus and method using the same. The source gas supply unit includes a canister in which a source is stored, a heater heating the canister, a source gas supply pipe provided on one side of the canister, a measuring unit installed on the source gas supply pipe and measuring an amount of source gas passing through the source gas supply pipe, and a temperature controller connected to the heater and the measuring unit. The temperature controller controls the heater based on the amount of the source gas measured by the measuring unit.

What is claimed is: 
     
         1 . A deposition method comprising:
 heating a canister using a heater to evaporate a source to produce a source gas;   measuring an amount of the produced source gas being supplied to outside of the canister through a source gas supply pipe, and sending the measured value to a temperature controller;   controlling the heater based on the measured amount of source gas using the temperature controller; and   mixing the source gas with a carrier gas supplied from a carrier gas supply, and supplying the mixture gas into a deposition chamber.   
     
     
         2 . The method according to  claim 1 , wherein heating the canister includes controlling the heater such that the temperature controller heats the canister to an initial set temperature. 
     
     
         3 . The method according to  claim 1 , wherein controlling the heater comprises controlling the heater to heat the canister to a temperature higher than a current temperature when the measured amount of source gas is less than a reference amount to be supplied, and controlling the heater to heat the canister to a temperature lower than the current temperature s when the measured amount of source gas is more than the reference amount to be supplied. 
     
     
         4 . The method according to  claim 1 , further comprising supplying the source from the source supply into the canister. 
     
     
         5 . A method of supplying source gas for use in deposition, the method comprising:
 detecting an amount of produced source gas being supplied to perform the deposition through a source gas supply pipe to a deposition chamber in which the deposition is performed; and   controlling a heater heating a source to produce the source gas based on the detected amount of source gas using a temperature controller to change an amount of heat produced by the heater.   
     
     
         6 . The method of  claim 5 , wherein the detecting the amount comprises measuring the amount using a measuring unit prior to mixing the produced source gas with a carrier gas. 
     
     
         7 . The method of  claim 6 , further comprising mixing the produced source gas with the carrier gas, and performing deposition of the source on a substrate using the mixed carrier and source gases. 
     
     
         8 . A computer readable medium encoded with processing instructions for implementing the method of  claim 5  using at least one processor.