US2013004655A1PendingUtilityA1

Flow-fill spacer structures for flat panel display device

Assignee: MOSAID TECHNOLOGIES INCPriority: May 17, 2000Filed: Sep 13, 2012Published: Jan 3, 2013
Est. expiryMay 17, 2020(expired)· nominal 20-yr term from priority
H01J 2329/00H01J 2329/863H01J 9/242H01J 31/123H01J 9/185Y10T29/49002H01J 29/864
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Claims

Abstract

A preferred embodiment of the invention is directed to support structures such as spacers used to provide a uniform distance between two layers of a device. In accordance with a preferred embodiment, the spacers may be formed utilizing flow-fill deposition of a wet film in the form of a precursor such as silicon dioxide. Formation of spacers in this manner provides a homogenous amorphous support structure that may be used to provide necessary spacing between layers of a device such as a flat panel display.

Claims

exact text as granted — not AI-modified
1 - 3 . (canceled) 
     
     
         4 . A display device, comprising:
 a plurality of cathodes configured to accept a negative charge;   a plurality of anodes, opposing said plurality of cathodes, configured to accept a positive charge;   a non-conductive material processed to form a plurality of spacers between said cathodes and said anodes; said plurality of spacers configured to provide a substantially uniform distance between said anodes and said cathodes.   
     
     
         5 . A display device as in  claim 4 , wherein said spacer is formed from a fluid precursor material to form a spacer between said cathodes and said anodes configured to provide a homogenous amorphous support structure a uniform distance between said anodes and said cathodes 
     
     
         6 . The device as recited in  claim 5 , wherein said fluid precursor material is a sol-gel precursor material. 
     
     
         7 . The device as recited in  claim 6 , wherein said fluid precursor material is deposited by chemical vapor deposition. 
     
     
         8 . The device as recited in  claim 5 , wherein the fluid precursor material extends beyond said anodes. 
     
     
         9 . The device as recited in  claim 5 , wherein the fluid precursor material is deposited by a flow fill deposition technique. 
     
     
         10 . The device as recited in  claim 4 , wherein the said anodes and said cathodes comprise a multi-layer device. 
     
     
         11 . The device as recited in  claim 4 , wherein the spacer material is formed in an I-shaped structure. 
     
     
         12 . The device as recited in  claim 4 , wherein the spacer material is formed in a T-shaped structure. 
     
     
         13 . The device as recited in  claim 4 , wherein the multi-layer device is a flat panel display.

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