US2012295119A1PendingUtilityA1
Method of making coated metal articles
Individually held — no corporate assignee on recordPriority: Oct 1, 2009Filed: Sep 17, 2010Published: Nov 22, 2012
Est. expiryOct 1, 2029(~3.2 yrs left)· nominal 20-yr term from priority
Inventors:Moses M. David
A63B 2209/00A63B 53/12B25G 3/26A63B 53/0487A63B 53/005A63B 2209/02A63B 60/22A63B 60/10Y10T428/31663A63B 2210/50A63B 53/14A63B 53/007C23C 14/0641A63B 60/06A63B 60/08
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Claims
Abstract
A method of making a coated metal article comprises (a) forming a hardcoat layer on at least a portion of a surface of a metal or metalized substrate by physical vapor deposition; (b) forming a tie layer comprising silicon, oxygen, and hydrogen on at least a portion of the surface of the hardcoat layer by plasma deposition; and (c) applying an at least partially fluorinated composition comprising at least one silane group to at least a portion of the surface of the tie layer.
Claims
exact text as granted — not AI-modified1 . A method of making a coated metal article comprising:
(a) forming a hardcoat layer on at least a portion of a surface of a metal or metalized substrate by physical vapor deposition; (b) forming a tie layer comprising silicon, oxygen, and hydrogen on at least a portion of the surface of the hardcoat layer by plasma deposition; (c) applying an at least partially fluorinated composition comprising at least one silane group to at least a portion of the surface of the tie layer.
2 . The method of claim 1 wherein the hardcoat layer is formed by cathodic arc, sputtering, thermal evaporation, or e-beam evaporation.
3 . The method of claim 1 wherein the hardcoat layer comprises a metal nitride or a mixed metal nitride.
4 . The method of claim 3 wherein the hardcoat layer comprises at least one of titanium nitride, zirconium nitride, aluminum nitride, or titanium aluminum nitride.
5 - 7 . (canceled)
8 . The method of claim 1 wherein forming the tie layer comprises ionizing a gas comprising at least one of an organosilicon or a silane compound.
9 . The method of claim 1 wherein the tie layer further comprises at least one of carbon, diamond-like glass, silicon oxycarbide, silicon carbide, silicon oxide, silicon dioxide, silicon nitride, or silicon oxynitride.
10 - 15 . (canceled)
16 . The method of claim 1 wherein the at least partially fluorinated composition comprising at least one silane group is a quat silane of Formula V:
wherein b and c is each independently an integer of 1 to 3; R f is a perfluorinated ether group; A is a linking group having the formula —C d H 2d ZC g H 2g —, wherein d and g are independently integers from 0 to 10 and Z is selected from the group consisting of a covalent bond, a carbonyl group, a sulfonyl group, a carboxamido group, a sulfonamido group, an iminocarbonyl group, an iminosulfonyl group, an oxycarbonyl group, a urea group, a urethane group, a carbonate group, and a carbonyloxy group; Y is a bridging group having 1 to 10 carbon atoms, a valency of 2 to 6, and comprising at least one of an alkylene group or an arylene group; Q is a connecting group having 1 to 10 carbon atoms, a valency of 2 to 6, and comprising at least one of an alkylene group or an arylene group; R 1 and R 2 are independently selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, and an aralkyl group; each R 3 is independently selected from the group consisting of hydroxy groups, alkoxy groups, acyl groups, acyloxy groups, halo groups, and polyether groups; and X − is a counter ion selected from the group consisting of inorganic anions, organic anions, and combinations thereof.
17 . The method of claim 1 wherein the at least partially fluorinated composition comprising at least one silane group is a quat silane of Formula VI:
wherein R f has the structure —CF(CF 3 )(OCF 2 CF(CF 3 )) m OCF 2 CF 2 CF 2 CF 2 O(CF(CF 3 )CF 2 O) n CF(CF 3 )—, wherein m is an integer of 1 to 12 and n is an integer of 2 to 10; c is an integer from about 1 to about 3; A is a linking group having the formula —C d H 2d ZC g H 2g —, wherein d and g are independently integers from about 0 to about 10 and Z is selected from the group consisting of a covalent bond, a carbonyl group, a sulfonyl group, a carboxamido group, a sulfonamido group, an iminocarbonyl group, an iminosulfonyl group, an oxycarbonyl group, a urea group, a urethane group, a carbonate group, and a carbonyloxy group; Y is a bridging group comprising an alkylene group having about 1 to about 6 carbon atoms; Q is a connecting group comprising an alkylene group having about 1 to about 6 carbon atoms; R 1 and R 2 are independently alkyl groups having about 1 to about 4 carbon atoms; each R 3 is independently selected from the group consisting of hydroxy groups, methoxy groups, ethoxy groups, acetoxy groups, chloro groups, and polyether groups; and X − is a counter ion selected from the group consisting of a halide, sulfate, phosphate, an alkyl sulfonate, an aryl sulfonate, an alkyl phosphonate, an aryl phosphonate, a fluorinated alkyl sulfonate, a fluorinated aryl sulfonate, a fluorinated alkyl sulfonimide, a fluorinated alkyl methide, and combinations thereof.
18 . The method of claim 1 wherein the at least partially fluorinated composition comprising at least one silane group comprises hexafluoropropyleneoxide.
19 . The method of claim 1 wherein the at least partially fluorinated composition comprising at least one silane group comprises a composition comprising:
(a) a first polyfluoropolyether silane of the Formula VIIa:
CF 3 CF 2 CF 2 O(CF(CF 3 )CF 2 O) p CF(CF 3 )—C(O)NH(CH 2 ) 3 Si(Y) 3 VIIa
wherein each Y is independently a hydrolyzable group and wherein p is 3 to 50; and
(b) a second polyfluoropolyether silane of the Formula IIXa:
(Y′) 3 Si(CH 2 ) 3 NHC(O)—CF 2 O(CF 2 O) m (C 2 F 4 O) q CF 2 —C(O)NH(CH 2 ) 3 Si(Y′) 3 IIXa
wherein each Y′ is independently a hydrolyzable group and wherein m is 1 to 50 and q is 3 to 40.
20 . The method of claim 1 wherein the at least partially fluorinated composition comprising at least one silane group comprises a composition comprising:
(a) a first polyfluoropolyether silane entity of the Formula VIIb:
CF 3 CF 2 CF 2 O(CF(CF 3 )CF 2 O) p CF(CF 3 )—C(O)NH(CH 2 ) 3 Si(O—) 3 VIIb
wherein p is 3 to 50; and
(b) a second polyfluoropolyether silane entity of the Formula IIXb:
(—O) 3 Si(CH 2 ) 3 NHC(O)—CF 2 O(CF 2 O) m (C 2 F 4 O) q CF 2 —C(O)NH(CH 2 ) 3 Si(O—) 3 IIXb
wherein m is 1 to 50 and q is 3 to 40.
21 . The method of claim 1 wherein the hardcoat layer is formed using cathodic arc deposition, the tie layer is formed using ion-assisted plasma deposition, and the at least partially fluorinated composition is applied by thermal evaporation and condensation of the composition.
22 . The method of claim 21 wherein the hardcoat layer is formed, the tie layer is formed, and the at least partially fluorinated composition is applied within a single deposition chamber.
23 . The method of claim 1 wherein the metal or metalized substrate comprises stainless steel.
24 . A coated metal article comprising:
(a) a metal or metalized substrate; (b) a physical vapor deposited hardcoat layer disposed on at least a portion of the metal or metalized substrate; (c) a plasma deposited tie layer comprising silicon, oxygen, and hydrogen disposed on at least a portion of the surface of the hardcoat layer; and (d) an at least partially fluorinated composition comprising at least one silane group disposed on at least a portion of the surface of the tie layer.
25 . The coated metal article of claim 24 wherein the article is a cutting tool or element.
26 . The coated metal article of claim 24 wherein the article is a kitchen or bathroom fixture or appliance.
27 . The coated metal article of claim 24 wherein the hardcoat layer comprises a metal nitride or a mixed metal nitride.
28 . The coated metal article of claim 24 wherein the tie layer further comprises carbon.
29 . The coated metal article of claim 24 wherein the at least partially fluorinated composition comprising at least one silane group comprises hexafluoropropyleneoxide.Join the waitlist — get patent alerts
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