Continuous micro anode guided electroplating device and method thereof

Abstract

A continuous micro anode guided electroplating device and a method thereof are revealed. By real-time image monitoring and capillary action of the micro/nanoscale tube, a three-dimensional microstructure is deposited on a workpiece at the cathode. The deposit is growing smoothly under the real-time image monitoring. Moreover, the workpiece is not immersed in an electrolyte so that contaminations of the workpiece caused by electrolyte are reduced.

1 . A method of continuous micro anode guided electroplating comprising the steps of:
 disposing a micro anode above a cathode,   adding an electrolyte into the micro anode,   applying a bias to the micro anode and the cathode,   generating a deposit at the cathode from the micro anode,   capturing an image between the micro anode and the cathode, and   checking a distance between the micro anode and the cathode according to the image and controlling movement of a loading platform so as to maintain the distance between the micro anode and the cathode at a fixed value.   
     
     
         2 . The device as claimed in  claim 1 , wherein the fixed value of the distance ranges from 10 mm (micrometer) to 20 mm. 
     
     
         3 . The device as claimed in  claim 1 , wherein the image is treated by binary processing. 
     
     
         4 . The device as claimed in  claim 1 , wherein the micro anode includes a capillary and a conductor while the conductor is disposed inside the capillary. 
     
     
         5 . The device as claimed in  claim 4 , wherein the conductor is made from platinum.