Apparatus for reducing etching marks on solar cell surface

Abstract

An apparatus for reducing etching marks on a solar cell surface includes an etching bath, an etchant-feeding pipe configured in the etching bath, and a bubble guiding device that covers the etchant-feeding pipe. The bubble guiding device guides bubbles discharged from the etchant-feeding pipe to move toward at least one end of the etchant-feeding pipe for reducing etching marks on the solar cell surface.

1 . An apparatus for reducing etching marks on a solar cell surface, the apparatus being adapted to a process of etching a solar cell, the apparatus at least comprising:
 an etching bath;   an etchant-feeding pipe configured in the etching bath; and   a bubble guiding device covering the etchant-feeding pipe, so as to guide bubbles discharged from the etchant-feeding pipe to move toward at least one end of the etchant-feeding pipe.   
     
     
         2 . The apparatus as claimed in  claim 1 , wherein the bubble guiding device comprises a filter. 
     
     
         3 . The apparatus as claimed in  claim 2 , wherein the bubble guiding device further comprises a fixing member configured in the middle of the etchant-feeding pipe for fixing the filter. 
     
     
         4 . The apparatus as claimed in  claim 2 , wherein the bubble guiding device further comprises at least one supporting member configured at the at least one end of the etchant-feeding pipe for supporting the filter. 
     
     
         5 . The apparatus as claimed in  claim 1 , wherein a plurality of etchant outlets are configured between the ends of the etchant-feeding pipe. 
     
     
         6 . The apparatus as claimed in  claim 1 , further comprising an etchant-feeding bath connected to the etchant-feeding pipe, so as to continuously provide the etching bath with an etchant. 
     
     
         7 . The apparatus as claimed in  claim 6 , further comprising a motor for pumping the etchant from the etchant-feeding bath and moving the pumped etchant into the etching bath. 
     
     
         8 . The apparatus as claimed in  claim 6 , further comprising an etchant recycling pipe connected between the etching bath and the etchant-feeding bath, so as to cyclically provide the etchant. 
     
     
         9 . The apparatus as claimed in  claim 1 , further comprising a silicon substrate moving device configured above the etchant-feeding pipe in the etching bath. 
     
     
         10 . The apparatus as claimed in  claim 9 , wherein the silicon substrate moving device comprises a plurality of rollers for continuously moving a silicon substrate.