Nanoimprint lithography templates

Abstract

Nanoimprint lithography templates are provided. One such template includes a template base and a plurality of pattern layers of a first material. Each pattern layer is separated from an adjacent pattern layer by a spacing layer of a second material that is different from the first material. Such a template also includes a plurality of pillars of a third material that is different from the first material. Each of the pillars separates two adjacent pattern layers, and each of the pattern layers has a respective portion which protrudes from the spacing layers and from the pillars.

1 . An in-process nanoimprint lithography template, comprising:
 a template base having a major surface;   at least one cross sectional pillar on the major surface of the template base;   a blanket pattern layer over the major surface and over the at least one cross sectional pillar;   a blanket spacing layer on the blanket pattern layer;   a filler layer at least partially covering the blanket pattern layer and over the blanket spacing layer.   
     
     
         2 . The in-process nanoimprint lithography template of  claim 1  further comprising a plurality of alternating blanket pattern layers and blanket spacing layers, wherein the filler layer completely covers the plurality of alternating blanket pattern layers and blanket spacing layers. 
     
     
         3 . The in-process nanoimprint lithography template of claim I further comprising a plurality of etched alternating blanket pattern layers and blanket spacing layers, wherein the filler layer only partially covers the plurality of alternating blanket pattern layers and blanket spacing layers. 
     
     
         4 . The in-process nanoimprint lithography template of  claim 3 , wherein portions of the plurality of etched pattern layers protrude from the plurality of blanket spacing layers. 
     
     
         5 . The in-process nanoimprint lithography template of  claim 3  wherein the template base is a sacrificial first template base, and the nanoimprint lithography template further comprises a second template base adhered to the plurality of etched alternating blanket pattern layers and blanket spacing layers. 
     
     
         6 . The in-process nanoimprint lithography template of  claim 5  wherein the second template base is adhered to the filler layer and to the at least one cross sectional pillar. 
     
     
         7 . A nanoimprint lithography template, comprising:
 a template base;   a plurality of pattern layers of a first material, with each pattern layer separated from an adjacent pattern layer by a spacing layer of a second material different from the first material;   a plurality of pillars of a third material different from the first material, wherein each of the pillars separate two adjacent pattern layers,   wherein each of the pattern layers has a respective portion which protrudes from the spacing layers and from the pillars.   
     
     
         8 . The nanoimprint lithography template of  claim 7 , wherein:
 the template base comprises a horizontally oriented major surface;   each pattern layer comprises a horizontally oriented portion and a vertically oriented portion; and   each spacing layer comprises a horizontally oriented portion and a vertically oriented portion.   
     
     
         9 . The nanoimprint lithography template of  claim 7 , wherein:
 the template base comprises a horizontally oriented major surface;   each pattern layer comprises a horizontally oriented portion and comprises a vertically oriented portion which extends away from the template base; and   each spacing layer comprises a horizontally oriented portion and comprises a vertically oriented portion which extends away from the template base.   
     
     
         10 . The nanoimprint lithography template of  claim 7 , wherein:
 the template base comprises a horizontally oriented major surface;   each pattern layer is adhered to the template base with an adhesive and comprises a vertically oriented portion which extends away from the template base; and   each spacing layer is adhered to the template base with an adhesive and comprises a vertically oriented portion which extends away from the template base.   
     
     
         11 . The nanoimprint lithography template of  claim 7 , wherein the third material comprises borophosphosilicate glass (BPSG), the second material comprises tetraethyl orthosilicate (TEOS), and the first material comprises polysilicon. 
     
     
         12 . The nanoimprint lithography template of  claim 7 , wherein the third material and the second material comprise silicon nitride. 
     
     
         13 . The nanoimprint lithography template of  claim 7 , wherein the first material comprises metal. 
     
     
         14 . The nanoimprint lithography template of  claim 7 , wherein the template base comprises a semiconductor-based material. 
     
     
         15 . The nanoimprint lithography template of  claim 7 , wherein the third material comprises an oxide. 
     
     
         16 . The nanoimprint lithography template of  claim 8 , further comprising a a filler layer over the horizontally oriented portion of at least one of the pattern layers. 
     
     
         17 . The nanoimprint lithography template of  claim 16 , wherein the filler layer comprises spun-on glass (SOG). 
     
     
         17 . The nanoimprint lithography template of  claim 7 , wherein the template base comprises quartz. 
     
     
         18 . The nanoimprint lithography template of  claim 17 , wherein the pattern layers, spacing layers and pillars are adhered to the quartz template base by an adhesive. 
     
     
         19 . The nanoimprint lithography template of  claim 18 , wherein the adhesive comprises a photoresist. 
     
     
         20 . The nanoimprint lithography template of  claim 7 , wherein the portions of the pattern layers which protrude comprise blades.