Evaporation method, evaporation device and method of fabricating light emitting device

Abstract

The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.

1 . An evaporation apparatus comprising:
 a holder for supporting a substrate; and   an evaporation source holder for supporting an evaporation material,   wherein the evaporation source holder is arranged to irreversibly move along a route, and   wherein the route allows the evaporation source holder to be placed in a region, which does not overlap with the substrate, before evaporation, to be moved under the substrate while evaporating the evaporation material in the evaporation source holder, and to be returned to its original position after the evaporation.   
     
     
         2 . The evaporation apparatus according to  claim 1 ,
 wherein the route is arranged so that the evaporation source holder is moved in a first direction during the evaporation, and   wherein the first direction is parallel to one of sides of the substrate.   
     
     
         3 . The evaporation apparatus according to  claim 2 , wherein the route is arranged so that the evaporation source holder is moved in the first direction a plurality of times during the evaporation. 
     
     
         4 . The evaporation apparatus according to  claim 2 ,
 wherein the route is further arranged so that the evaporation source holder is moved in a second direction during the evaporation, and   wherein the second direction is perpendicular to the first direction.   
     
     
         5 . The evaporation apparatus according to  claim 4 , wherein the route is arranged so that the evaporation source holder is moved in the second direction a plurality of times during the evaporation. 
     
     
         6 . The evaporation apparatus according to  claim 4 , wherein the route consists of movement in the first direction and the second direction. 
     
     
         7 . The evaporation apparatus according to  claim 1 , wherein the holder is arranged to fix a position of the substrate during the evaporation. 
     
     
         8 . An evaporation apparatus comprising:
 a holder for supporting a substrate;   a first evaporation source holder for supporting a first evaporation material; and   a second evaporation source holder for supporting a second evaporation material,   wherein the first evaporation source holder is arranged to irreversibly move along a route,   wherein the second evaporation source holder is arranged to irreversibly move along the same route as the first evaporation source holder,   wherein the route allows the first evaporation source holder and the second evaporation source holder to be placed in a region, which does not overlap with the substrate, before evaporation, to be moved under the substrate while evaporating the first evaporation material and the second evaporation material in the first evaporation source holder and the second evaporation source holder, respectively, and to be returned to their original positions after the evaporation.   
     
     
         9 . The evaporation apparatus according to  claim 8 , wherein the second evaporation source holder is arranged to evaporate the second evaporation material during the evaporation of the first evaporation material. 
     
     
         10 . The evaporation apparatus according to  claim 8 ,
 wherein the route is arranged so that the first evaporation source holder and the second evaporation source holder are moved in a first direction during the evaporation, and   wherein the first direction is parallel to one of sides of the substrate.   
     
     
         11 . The evaporation apparatus according to  claim 10 , wherein the route is arranged so that the first evaporation source holder and the second evaporation source holder are moved in the first direction a plurality of times during the evaporation. 
     
     
         12 . The evaporation apparatus according to  claim 10 ,
 wherein the route is further arranged so that the first evaporation source holder and the second evaporation source holder are moved in a second direction during the evaporation, and   wherein the second direction is perpendicular to the first direction.   
     
     
         13 . The evaporation apparatus according to  claim 12 , wherein the route is arranged so that the first evaporation source holder and the second evaporation source holder are moved in the second direction a plurality of times during the evaporation. 
     
     
         14 . The evaporation apparatus according to  claim 12 , wherein the route consists of movement in the first direction and the second direction. 
     
     
         15 . The evaporation apparatus according to  claim 8 , wherein the holder is arranged to fix a position of the substrate during the evaporation. 
     
     
         16 . A method of forming a film over a substrate by evaporation, the method comprising:
 moving an evaporation source holder, which is configured to support an evaporation material, along a route irreversibly while evaporating the evaporation material,   wherein the route allows the evaporation source holder to be placed in a region, which does not overlap with the substrate, before the evaporation, to be moved under the substrate while evaporating the evaporation material in the evaporation source holder, and to be returned to its original position after the evaporation.   
     
     
         17 . The method according to  claim 16 ,
 wherein the route is arranged so that the evaporation source holder is moved in a first direction during the evaporation, and   wherein the first direction is parallel to one of sides of the substrate.   
     
     
         18 . The method according to  claim 17 , wherein the route is arranged so that the evaporation source holder is moved in the first direction a plurality of times during the evaporation. 
     
     
         19 . The method according to  claim 17 ,
 wherein the route is further arranged so that the evaporation source holder is moved in a second direction during the evaporation, and   wherein the second direction is perpendicular to the first direction.   
     
     
         20 . The method according to  claim 19 , wherein the route is arranged so that the evaporation source holder is moved in the second direction a plurality of times during the evaporation. 
     
     
         21 . The method according to  claim 19 , wherein the route consists of movement in the first direction and the second direction. 
     
     
         22 . The method according to  claim 16 , wherein a position of the substrate is fixed during the evaporation. 
     
     
         23 . A method of forming a film over a substrate by evaporation, the method comprising:
 moving a first evaporation source holder, which is configured to support a first evaporation material, along a route irreversibly while evaporating the first evaporation material; and   moving the second evaporation source holder, which is configured to support a second evaporation material, along the same route as the first evaporation source holder irreversibly while evaporating the second evaporation material,   wherein the route allows the first evaporation source holder and the second evaporation source holder to be placed in a region, which does not overlap with the substrate, before the evaporation, to be moved under the substrate while evaporating the first evaporation material and the second evaporation material in the first evaporation source holder and in the second evaporation source holder, respectively, and to be returned to their original positions after the evaporation.   
     
     
         24 . The method according to  claim 23 ,
 wherein the route is arranged so that the first evaporation source holder and the second evaporation source holder are moved in a first direction during the evaporation, and   wherein the first direction is parallel to one of sides of the substrate.   
     
     
         25 . The method according to  claim 24 , wherein the route is arranged so that the first evaporation source holder and the second evaporation source holder are moved in the first direction a plurality of times during the evaporation. 
     
     
         26 . The method according to  claim 24 ,
 wherein the route is further arranged so that the first evaporation source holder and the second evaporation source holder are moved in a second direction during the evaporation, and   wherein the second direction is perpendicular to the first direction.   
     
     
         27 . The method according to  claim 26 , wherein the route is arranged so that the first evaporation source holder and the second evaporation source holder are moved in the second direction a plurality of times during the evaporation. 
     
     
         28 . The method according to  claim 26 , wherein the route consists of movement in the first direction and the second direction. 
     
     
         29 . The method according to  claim 23 , wherein a position of the substrate is fixed during the evaporation.