Polyhedral oligomeric silsesquioxane compositions, methods of using these compositions, and structures including these compositions

Abstract

Embodiments of the present disclosure include functionalized polyhedral oligomeric silsesquioxane compositions or mixtures, methods of using functionalized polyhedral oligomeric silsesquioxane compositions, structures including functionalized polyhedral oligomeric silsesquioxane, and the like.

1 . A composition, comprising:
 a functionalized polyhedral oligotheric silsesquioxane and a photocatalyst, wherein the functionalized polyhedral oligomeric silsesquioxane includes a cross-linkable group, wherein the functionalized polyhedral oligomeric silsesquioxane is about 80 to 99.9 weight % of the composition, and the photocatalyst is about 0.01 to 5 weight % of the composition, and optionally about 0.01 to 10 weight % of one or more additional components.   
     
     
         2 . A composition, consisting essentially of: a functionalized polyhedral oligomeric silesquixane and a photocatalyst, and optionally an additional component, wherein the functionalized polyhedral oligomeric silsesquioxane includes a cross-linkable group. 
     
     
         3 . A composition, consisting of: a functionalized polyhedral oligomeric silsesquioxane and a photocatalyst, wherein the functionalized polyhedral oligomeric silsesquioxane includes a cross-linkable group, wherein the functionalized polyhedral oligomeric silsesquioxane and the photocatalyst are dissolved in a solvent, and optionally an additional component. 
     
     
         4 . The composition of  claim 1 , wherein the functionalized polyhedral oligomeric silsesquioxane is a cage-shaped oligomer represented by the formula R n (SiO 1.5 ) n , wherein n is 8, 10, or 12, wherein the functionalized polyhedral oligomeric silsesquioxane has a structure having n number of corners, wherein Si is located at each corner and an R group is attached to the Si, the functionalized polyhedral oligomeric silsesquioxane structure is a three dimensional cage structure, wherein each R is independently selected from the group consisting of: H, a substituted or unsubstituted cyclic aliphatic group, a substituted or unsubstituted linear aliphatic group, a substituted or unsubstituted aryl group, and a combination thereof. 
     
     
         5 . The composition of  claim 1 , wherein the photocatalyst is selected from the group consisting of: triflic acid group catalysts, nonaflic acid group catalysts, FABA acid group catalysts, sulfonate (non-fluorinated) acid group catalysts, and a combination thereof. 
     
     
         6 . The composition of  claim 1 , wherein the composition is dissolved in a solvent selected from the group consisting of: mesitylene, gamma butyrolactone, ketone, alcohol, propylene glycol methyl ether acetate, anisole, N-methylpyrollidone, and a combination thereof. 
     
     
         7 . The composition of  claim 1 , wherein the additional component is selected from the group consisting of: a sensitizer, an antioxidant, an adhesion promotor, and a mixture thereof. 
     
     
         8 . A structure, comprising:
 a second layer made of a composition comprising a functionalized polyhedral oligomeric silsesquioxane that is disposed on a portion of a first layer, wherein the first layer is disposed on a substrate, wherein the second layer has a thickness of about 1 to 50 μm.   
     
     
         9 . The structure of  claim 8 , wherein the first layer is made of an organic polymer. 
     
     
         10 . The structure of  claim 8 , wherein the composition is selected from any one of the compositions described in  claim 1 . 
     
     
         11 . The structure of  claim 8 , wherein the second layer is a patterning layer so that portions of the first layer not having the patterning layer disposed on it are removable. 
     
     
         12 . The structure of  claim 8 , further comprising a third layer disposed on the second layer and the first layer, wherein the second layer, the third layer, and the substrate enclose a three dimensional area of the first layer. 
     
     
         13 . The structure of  claim 12 , wherein the three dimensional area of the first layer is removable to form a three dimensional air-gap. 
     
     
         14 . The structure of  claim 8 , wherein the structure includes one or more types of components selected from the group consisting of: a microelectronic component, a microfluidic component, a MEMS component, an optical device component, and a combination thereof. 
     
     
         15 . The structure of  claim 8 , wherein the second layer has a thickness of about 2 to 20 μm. 
     
     
         16 . The structure of  claim 8 , wherein the second layer has a thickness of about 3 to 15 μm. 
     
     
         17 . A method, comprising:
 disposing a second layer made of a composition comprising a functionalized polyhedral oligomeric silsesquioxane on a portion of a first layer, wherein the first layer is disposed on a substrate, wherein the second layer has a thickness of about 1 to 50 μm;   removing a portion of the second layer to expose a portion of the first layer; and   removing the portion of the first layer that is not covered by the second layer.   
     
     
         18 . The method of  claim 17 , further comprising:
 disposing a third layer on the second layer and the first layer, wherein the second layer, the third layer, and the substrate enclose a three dimensional area of the first layer; and   removing the three dimensional area of the first layer to form a three dimensional air-gap, wherein the second layer and the third layer enclose the three dimensional air-gap.   
     
     
         19 . The method of  claim 17 , wherein the composition is selected from any one of the compositions described in  claim 1 . 
     
     
         20 . The method of  claim 17 , wherein the second layer has a thickness of about 2 to 20 μm. 
     
     
         21 . The method of  claim 17 , wherein the second layer has a thickness of about 3 to 15 μm.