Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method

Abstract

An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination.

1 . An exposure apparatus which exposes a substrate with an exposure light through an exposure liquid, the exposure apparatus comprising:
 an optical element from which the exposure light exits;   a movable member which is arranged to hold the substrate and is movable on a light-exit side of the optical element, the movable member having a supply port which supplies a cleaning liquid; and   a vibration member which vibrates the cleaning liquid.   
     
     
         2 . The exposure apparatus according to  claim 1 ,
 wherein the vibration member includes a member provided to the movable member, and the cleaning liquid is vibrated via the member.   
     
     
         3 . The exposure apparatus according to  claim 1 ,
 wherein the cleaning liquid is the exposure liquid.   
     
     
         4 . The exposure apparatus according to  claim 3 ,
 wherein the exposure liquid includes pure water.   
     
     
         5 . The exposure apparatus according to  claim 1 ,
 wherein the cleaning liquid is different from the exposure liquid.