Plasma, uv and ion/neutral assisted ald or cvd in a batch tool

Abstract

CVD and ALD methods of using a batch processing chamber to process substrates are described. A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.

1 . An apparatus, comprising:
 a chamber;   a substrate support disposed in the chamber and facing a top of the chamber; and   a gas injector disposed inside the chamber along a side of the chamber, the gas injector comprising a gas flow channel that is a source of energy for exciting a gas in the gas flow channel.   
     
     
         2 . The apparatus of  claim 1 , wherein the gas flow channel is formed in an electrode. 
     
     
         3 . The apparatus of  claim 1 , wherein the gas injector is an electrode. 
     
     
         4 . The apparatus of  claim 1 , wherein the gas injector comprises a UV source. 
     
     
         5 . The apparatus of  claim 2 , wherein the injector is oriented in a direction perpendicular to a plane defined by the substrate support. 
     
     
         6 . The apparatus of  claim 3 , wherein the gas injector is vertically oriented. 
     
     
         7 . The apparatus of  claim 6 , wherein the gas injector comprises vertical openings. 
     
     
         8 . An apparatus, comprising:
 a chamber;   a substrate support disposed in the chamber and facing a top of the chamber;   a gas injector disposed inside the chamber along a side of the chamber, the gas injector comprising a gas flow channel formed in an electrode; and   an exhaust assembly that comprises an electrode.   
     
     
         9 . The apparatus of  claim 8 , wherein each of the gas injector and the exhaust assembly is oriented in a direction perpendicular to a plane defined by the substrate support. 
     
     
         10 . The apparatus of  claim 8 , wherein the exhaust assembly comprises a plurality of electrodes. 
     
     
         11 . The apparatus of  claim 8 , further comprising a power supply coupled to the gas injector and the exhaust assembly. 
     
     
         12 . The apparatus of  claim 8 , wherein the substrate support is between the gas injector and the exhaust assembly. 
     
     
         13 . The apparatus of  claim 8 , wherein the gas injector comprises a plurality of vertical openings.