Processing apparatus

Abstract

There is provided a processing apparatus including a processing gas discharge unit provided within a processing chamber so as to face a mounting table and configured to discharge a processing gas into the processing chamber; a first space corresponding to a central portion of a processing target object; a second space corresponding to an edge portion of the processing target object; at least one third space formed between the first space and the second space; and a processing gas distribution unit including processing gas distribution pipes and valves. The spaces are provided within the processing gas discharge unit and partitioned by partition walls. At the spaces, there are formed discharge holes for discharging the processing gas. The processing gas distribution pipes communicate with the spaces, and the valves are opened or closed to allow adjacent processing gas distribution pipes to communicate with each other or be isolated from each other.

1 . A processing apparatus capable of changing at least one of a supply amount and a kind of a processing gas that is discharged to a processing target object depending on a position in a surface of the processing target object, the processing apparatus comprising:
 a processing chamber for performing therein a process on the processing target object by using the processing gas;   a mounting table provided within the processing chamber, for mounting thereon the processing target object;   a processing gas discharge unit provided within the processing chamber so as to face the mounting table and configured to discharge the processing gas into the processing chamber;   a space group that is provided within the processing gas discharge unit and partitioned by partition walls, and that includes a first space corresponding to a central portion in the surface of the processing target object, a second space corresponding to an edge portion in the surface of the processing target object and at least one third space between the first space and the second space, the first to the third spaces being provided with discharge holes through which the processing gas is discharged; and   a processing gas distribution unit including:   a processing gas distribution pipe group that includes processing gas distribution pipes communicating with the first space, the second space and the at least one third space; and
 a valve group that includes valves opened or closed to allow adjacent processing gas distribution pipes to communicate with each other or be isolated from each other. 
   
     
     
         2 . The processing apparatus of  claim 1 , wherein a discharging position of the processing gas discharged to the central portion in the surface of the processing target object is varied to at least two positions and a discharging position of the processing gas discharged to the edge portion in the surface of the processing target object are varied to at least two positions by opening or closing the valves of the valve group. 
     
     
         3 . The processing apparatus of  claim 1 , further comprising:
 a first processing gas main supply pipe for flowing therethrough a first processing gas; and   a second processing gas main supply pipe for flowing therethrough a second processing gas different from the first processing gas in at least one of a supply amount and a kind of gas,   wherein the first processing gas main supply pipe is connected with a first processing gas distribution pipe belonging to the processing gas distribution pipes and communicating with the first space, and   the second processing gas main supply pipe is connected with a second processing gas distribution pipe belonging to the processing gas distribution pipes and communicating with the second space.   
     
     
         4 . The processing apparatus of  claim 3 , wherein a discharging position of the first processing gas and a discharging position of the second processing gas are changed by closing one valve of the valve group. 
     
     
         5 . The processing apparatus of  claim 3 , further comprising:
 at least one third processing gas main supply pipe for flowing therethrough a third processing gas different from the first and second processing gases in at least one of a supply amount and a gas kind,   wherein the number of the at least one third space is three or more, and   the at least one third processing gas main supply pipe is connected with at least one third processing gas distribution pipe belonging to the processing gas distribution pipes and communicating with at least one of the at least three third spaces.   
     
     
         6 . The processing apparatus of  claim 5 , wherein discharging positions of the first, second and third processing gases are changed by closing at least two valves of the valve group. 
     
     
         7 . The processing apparatus of  claim 5 , wherein the at least one third processing gas main supply pipe is connected with the at least one third processing gas distribution pipe which is distanced from the first processing gas main supply pipe and the second processing gas main supply pipe via at least two valves. 
     
     
         8 . The processing apparatus of  claim 5 , wherein discharging positions of the first, second and third processing gases are changed by closing at least one valve between the first processing gas main supply pipe and the at least one third processing gas main supply pipe and by closing at least one valve between the second processing gas main supply pipe and the at least one third processing gas main supply pipe. 
     
     
         9 . The processing apparatus of  claim 1 , further comprising:
 a controller configured to control the valves to be opened or closed.