Coating solution for forming ultraviolet-absorbing film, and ultraviolet-absorbing glass article
Abstract
To provide a coating solution for forming an ultraviolet-absorbing film which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time, and an ultraviolet-absorbing glass article having an ultraviolet-absorbing film formed by using such a coating solution, which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time. A coating solution which comprises a component derived from an epoxidized organooxysilane compound, a component derived from an organooxysilane compound which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and a component derived from an organooxysilane compound other than the above both organooxysilane compounds, and an ultraviolet-absorbing glass article obtained by using the coating solution.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A coating solution for forming an ultraviolet-absorbing film, which comprises a combination of the following three components:
a component derived from an epoxidized organooxysilane compound (a), a component derived from an organooxysilane compound (b) which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and a component derived from an organooxysilane compound (c) other than the above (a) and (b),
wherein each of the above three components is the corresponding organooxysilane compound of the above (a), (b) or (c), or a constituting component of a partially hydrolyzed condensate of at least the corresponding organooxysilane compound of the above (a), (b) or (c).
2 . The coating solution for forming an ultraviolet-absorbing film according to claim 1 , wherein the proportions of the component derived from the organooxysilane compound (a), the component derived from the organooxysilane compound (b) which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and the component derived from the organooxysilane compound (c) other than the above (a) and (b) are such proportions that, based on 100 parts by mass of the total solid content of the component derived from the organooxysilane compound (a), the component derived from the organooxysilane compound (b) which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and the component derived from the organooxysilane compound (c) other than the above (a) and (b), the component derived from the organooxysilane compound (a) is from 5 to 50 parts by mass, the component derived from the organooxysilane compound (b) is from 10 to 50 parts by mass, and the component derived from the organooxysilane compound (c) is from 40 to 80 parts by mass.
3 . The coating solution for forming an ultraviolet-absorbing film according to claim 1 , which contains at least one member selected from polyepoxides and glycerin.
4 . The coating solution for forming an ultraviolet-absorbing film according to claim 3 , wherein the content of said at least one member selected from polyepoxides and glycerin is from 0.1 to 20 parts by mass, based on 100 parts by mass of the total solid content of the component derived from the organooxysilane compound (a), the component derived from the organooxysilane compound (b) which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and the component derived from the organooxysilane compound (c) other than the above (a) and (b).
5 . The coating solution for forming an ultraviolet-absorbing film according to claim 1 , which contains an acid having a primary proton pKa of from 1.0 to 5.0 in a proportion of from 0.005 to 5.0 mol/kg as the molar concentration, based on the total mass of the coating solution, of the proton when the primary proton of the acid is completely dissociated.
6 . The coating solution for forming an ultraviolet-absorbing film according to claim 1 , which contains fine particles of silica in a proportion of from 0.5 to 50 parts by mass, based on 100 parts by mass of the total solid content of the component derived from the organooxysilane compound (a), the component derived from the organooxysilane compound (b) which is a reaction product of a hydroxylated benzophenone compound and an epoxidized organooxysilane compound, and the component derived from the organooxysilane compound (c) other than the above (a) and (b), and water in a proportion of from 8 to 20 equivalents by molar ratio to the amount, calculated as SiO 2 , of the component derived from the organooxysilane compound (c).
7 . The coating solution for forming an ultraviolet-absorbing film according to claim 1 , wherein the content of the component derived from the organooxysilane compound (c) is from 1 to 10 mass % as the SiO 2 content when silicon atoms contained in this component are calculated as SiO 2 .
8 . An ultraviolet-absorbing glass article comprising a glass substrate and an ultraviolet-absorbing film formed on at least part of the glass substrate surface by using the coating solution for forming an ultraviolet-absorbing film as defined in claim 1 .
9 . The ultraviolet-absorbing glass article according to claim 8 , wherein the transmittance of light having a wavelength of 380 nm through the glass article is at most 7.0%.
10 . The ultraviolet-absorbing glass article according to claim 8 , wherein when an abrasion test of 1,000 rotations with a CS-10F abrasive wheel is applied against the surface of the ultraviolet-absorbing film in accordance with JIS-R3212 (1998), the increase in the haze after the test as compared to before the test is at most 5.0%.Join the waitlist — get patent alerts
Track US2012038976A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.