US2012034742A1PendingUtilityA1

Semiconductor device

Assignee: MUTO KUNIHARUPriority: Apr 27, 2007Filed: Oct 19, 2011Published: Feb 9, 2012
Est. expiryApr 27, 2027(~0.7 yrs left)· nominal 20-yr term from priority
H10W 90/766H10W 90/756H10W 90/736H10W 74/00H10W 72/07653H10W 72/07652H10W 72/07633H10W 72/07554H10W 72/07553H10W 72/07552H10W 72/07535H10W 72/07533H10W 72/07337H10W 72/07336H10W 72/5524H10W 72/5522H10W 72/5475H10W 72/5438H10W 72/5363H10W 72/952H10W 72/926H10W 72/923H10W 72/884H10W 72/871H10W 72/853H10W 72/652H10W 72/627H10W 72/537H10W 72/536H10W 72/534H10W 72/527H10W 72/353H10W 72/352H10W 72/325H10W 72/59H10W 46/607H10W 46/401H10W 46/103H10W 46/00H10W 72/0711H10W 72/016H10W 70/481H10W 70/466H10W 70/424H10W 70/411H10W 70/60H10W 70/457H10W 72/00H10D 64/256H10D 64/62H10D 62/105H10D 62/83H10D 30/668H10D 30/665H10D 12/481H10D 64/2527
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Claims

Abstract

To actualize a reduction in the on-resistance of a small surface mounted package having a power MOSFET sealed therein. A silicon chip is mounted on a die pad portion integrated with leads configuring a drain lead. The silicon chip has, on the main surface thereof, a source pad and a gate pad. The backside of the silicon chip configures a drain of a power MOSFET and bonded to the upper surface of a die pad portion via an Ag paste. A lead configuring a source lead is electrically coupled to the source pad via an Al ribbon, while a lead configuring a gate lead is electrically coupled to the gate pad via an Au wire.

Claims

exact text as granted — not AI-modified
1 - 19 . (canceled) 
     
     
         20 . A method of manufacturing a semiconductor device, comprising the steps of:
 (a) providing a lead frame including a chip mounting portion, a source lead, and a gate lead, wherein each of the chip mounting portion, the source lead, and the gate lead are electrically separated;   (b) providing a semiconductor chip including a power MOSFET, an obverse surface, and a reverse surface opposite the obverse surface,   wherein a source electrode pad and a gate electrode pad are formed on the obverse surface, and   wherein a drain electrode is formed on the reverse surface;   (c) mounting the semiconductor chip over a top surface of the chip mounting portion and connecting the drain electrode of the semiconductor chip and the chip mounting portion electrically;   (d) connecting the metal ribbon to the source electrode pad of the semiconductor chip and to the first lead of the lead frame electrically using a first bonding tool; and   (e) after the step (d), connecting the metal wire to the gate electrode pad of the semiconductor chip and to the first lead of the lead frame electrically using a second bonding tool.   
     
     
         21 . The method of manufacturing a semiconductor device according to  claim 20 ,
 wherein in the step (d), said connection of the metal ribbon and the source electrode pad of the semiconductor chip is made two or more times.   
     
     
         22 . The method of manufacturing a semiconductor device according to  claim 21 ,
 wherein a plurality of connecting portions of the metal ribbon and the source electrode pad of the semiconductor chip is formed over the source electrode pad of the semiconductor chip.   
     
     
         23 . The method of manufacturing a semiconductor device according to  claim 22 ,
 wherein a width of each of the plurality of connecting portion is substantially the same.   
     
     
         24 . The method of manufacturing a semiconductor device according to  claim 20 ,
 wherein a vibration energy of the first bonding tool is larger than a vibration energy of the second bonding tool.   
     
     
         25 . The method of manufacturing a semiconductor device according to  claim 20 ,
 wherein the semiconductor chip is mounted over the top surface of the chip mounting portion via Ag paste.   
     
     
         26 . The method of manufacturing a semiconductor device according to  claim 20 , further comprising the steps of:
 (f) sealing the semiconductor chip, a part of the chip mounting portion, a part of the source lead, a part of the gate lead, the metal ribbon, and the metal wire using a sealing body; and   (g) cutting each of said parts of the source and gate leads from the lead frame.   
     
     
         27 . The method of manufacturing a semiconductor device according to  claim 26 ,
 wherein the chip mounting portion is sealed such that a bottom surface opposite the top surface of the chip mounting portion is exposed from the sealing body.   
     
     
         28 . The method of manufacturing a semiconductor device according to  claim 20 ,
 wherein the lead frame has a drain lead which is coupled the chip mounting portion, and   wherein the drain electrode of the semiconductor chip is connected to the drain lead electrically.   
     
     
         29 . The method of manufacturing a semiconductor device according to  claim 20 ,
 wherein an area of the source pad is larger than an area of the gate pad.

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