Processing method
Abstract
A processing method includes disposing a workpiece having a processed surface in a processing solution, disposing a photocatalyst film in the processing solution opposite the processed surface, irradiating the photocatalyst film with a light, so as to generate active species from the processing solution by a photocatalytic action of the photocatalyst film, controlling a diffusion distance of the active species in the processing solution by a radical scavenger added to the processing solution, and chemically reacting the active species with surface atoms of the processed surface and generating a chemical compound to be eluted in the processing solution, so as to process the workpiece.
Claims
exact text as granted — not AI-modified1 . A processing method comprising:
disposing a workpiece having a processed surface in a processing solution, disposing a photocatalyst film in the processing solution opposite the processed surface, irradiating the photocatalyst film with a light, so as to generate active species from the processing solution by a photocatalytic action of the photocatalyst film, controlling a diffusion distance of the active species in the processing solution by a radical scavenger added to the processing solution, and chemically reacting the active species with surface atoms of the processed surface and generating a chemical compound to be eluted in the processing solution, so as to process the workpiece.
2 . The processing method according to claim 1 , wherein the workpiece is processed by controlling a temperature of at least one member selected from the group consisting of the photocatalyst film, the workpiece and the processing solution.
3 . The processing method according to claim 1 , wherein the radical scavenger comprises a protic organic compound.
4 . The processing method according to claim 3 wherein the protic organic compound comprises one of methanol, ethanol, propanol and butanol, or a mixture liquid of not less than two selected therefrom.
5 . The processing method according to claim 1 , wherein the photocatalyst film comprises a film of TiO 2 , and the TiO 2 comprises an anatase-type crystal or a rutile-type crystal, or a mixed crystal of the anatase-type crystal and the rutile-type crystal.
6 . The processing method according to claim 1 , wherein the light has a wavelength of not more than 420 nm.
7 . The processing method according to claim 1 , wherein the photocatalyst film is disposed on a substrate formed of quartz or glass.
8 . The processing method according to claim 7 wherein the light is irradiated from a side of the substrate toward the photocatalyst film, so as to generate active species.
9 . The processing method according to claim 1 , wherein the workpiece disposed in the processing solution comprises at least one material selected from the group consisting of SiC, GaN, sapphire, ruby and diamond.Join the waitlist — get patent alerts
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