US2011312084A1PendingUtilityA1

Use of a transparent composition for photobioreactors

Assignee: DELPRAT PATRICKPriority: Jan 22, 2009Filed: Jan 22, 2010Published: Dec 22, 2011
Est. expiryJan 22, 2029(~2.5 yrs left)· nominal 20-yr term from priority
C12M 23/20C12M 39/00Y10T428/3175Y10T428/31855C12M 21/02Y10T428/3154Y10T428/1393C12M 23/22
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Claims

Abstract

The present invention relates to photobioreactors and more particularly to the use of a transparent composition based on at least one methacrylic polymer for constructing installations for the culture of photosensitive organisms. This composition can be in the form of films, plates, profiled elements or cylinders such as tubes. The invention also relates to a transparent multilayer structure comprising at least one layer of a methacrylic polymer and one layer comprising at least one antifouling additive, and to the use thereof for constructing installations for the culture of photosensitive organisms.

Claims

exact text as granted — not AI-modified
1 . A photobioreactor for the culture of photosensitive organisms comprising a transparent composition of at least one methacrylic polymer wherein the methacrylic polymer is a homopolymer of methyl methacrylate (PMMA) or a copolymer of methyl methacrylate (MMA), comprising at least 50% by weight of MMA—said methacrylic polymer having a weight-average molecular weight ranging from 90 000 g/mol to 170 000 g/mol (PMMA standard), wherein said composition comprises at least one antifouling and/or antistatic additive. 
     
     
         2 . (canceled) 
     
     
         3 . The photobioreactor of  claim 1 , wherein said antifouling and/or antistatic additive is a copolymer comprising polyamide blocks and polyether blocks that is present at a content ranging from 3% to 15% by weight relative to the total composition. 
     
     
         4 . The photobioreactor of  claim 1 , wherein said antifouling and/or antistatic additive is a fluoropolymer chosen from homopolymers and copolymers of vinylidene fluoride (VDF) containing at least 50% by weight of VDF; copolymers of tetrafluoroethylene and of ethylene (ETFE); homopolymers and copolymers of trifluoroethylene (VF 3 ); copolymers combining VDF and tetrafluoroethylene (EFEP); copolymers combining the residues of chlorotrifluoroethylene (CTFE), tetrafluoroethylene (TFE), hexafluoropropylene (HFP) and/or ethylene units; terpolymers combining the residues of chlorotrifluoroethylene (CTFE), tetrafluoroethylene (TFE), hexafluoropropylene (HFP) and/or ethylene units and, optionally, VDF and/or VF 3  units, the fluoropolymer being present at a content ranging from 5 to 60% by weight relative to the total composition. 
     
     
         5 . The photobioreactor of  claim 4 , wherein said fluoropolymer is a PVDF homopolymer or copolymer containing at least 75% of VDF. 
     
     
         6 . The photobioreactor of  claim 1 , wherein said composition is in the form of films, plates, profiled elements or cylinders such as tubes. 
     
     
         7 . A multilayer structure comprising:
 one layer of at least one methacrylic polymer,   one layer comprising at least one antifouling additive that is in contact with a culture medium,   
       the layers being directly in contact with one another. 
     
     
         8 . The multilayer structure as claimed in  claim 7 , wherein the layer that is in contact with a culture medium consists either of an antifouling methacrylic polymer defined as a methacrylic polymer to which has been added at least one antifouling additive chosen from copolymers comprising polyamide blocks and polyether blocks or fluoropolymers, or antifouling fluoropolymer. 
     
     
         9 . The multilayer structure as claimed in  claim 7 , comprising, in the following order, at least:
 one layer comprising at least one antistatic additive that is in contact with the air or the outside environment,   one layer of at least one methacrylic polymer,   one layer comprising at least one antifouling additive that is in contact with a culture medium.   
     
     
         10 . The structure as claimed in  claim 9 , wherein the layer in contact with the air or the outside environment consists of an antistatic methacrylic polymer, defined as a methacrylic polymer to which has been added from 5 to 10% of an antistatic additive chosen from copolymers comprising polyamide blocks and polyether blocks. 
     
     
         11 . The multilayer structure as claimed in  claim 7 , wherein said structure is in the form of a tube, a profiled element or a plate. 
     
     
         12 . The multilayer tube as claimed in  claim 11 , wherein said tube has a diameter ranging from 2 to 100 cm and a length from 1 to 50 m. 
     
     
         13 . The multilayer plate as claimed in  claim 11 , wherein said plate has a thickness ranging from 1 to 100 mm. 
     
     
         14 . The multilayer structure as claimed in  claim 7 , comprising an installation for the culture of photosensitive organisms. 
     
     
         15 . (canceled) 
     
     
         16 . The photobioreactor of  claim 1 , wherein said photosensitive organisms, are selected from the group consisting of photosynthetic bacteria, microalgae, microorganisms, and plankton. 
     
     
         17 . The photobioreactor of  claim 14 , wherein said photosensitive organisms, are selected from the group consisting of photosynthetic bacteria, microalgae, microorganisms, and plankton

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