US2011308461A1PendingUtilityA1
Electron Beam Enhanced Nitriding System (EBENS)
Individually held — no corporate assignee on recordPriority: Jun 22, 2004Filed: Aug 17, 2010Published: Dec 22, 2011
Est. expiryJun 22, 2024(expired)· nominal 20-yr term from priority
H01J 37/3233H01J 37/32009H05H 1/26H05H 2245/40C23C 8/36H01J 2237/3387
39
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Claims
Abstract
An electron beam enhanced nitriding system that passes a high-energy electron beam through nitrogen gas to form a low electron temperature plasma capable of delivering nitrogen ions and radicals to a substrate to be nitrided. The substrate can be mounted on an electrode, and the substrate can be biased and heated.
Claims
exact text as granted — not AI-modified1 - 18 . (canceled)
19 . A nitriding system, comprising:
a. a gas comprising nitrogen; b. a cylindrical high energy electron beam source; c. a low electron temperature cylindrical plasma, wherein the plasma is produced by the electron beam passing through the gas; and d. a cylindrical substrate, the interior of which is to be nitrided, wherein the cylindrical substrate is co-axial with the electron beam and can be positioned at a variable distance from the electron beam; wherein nitrogen ions and radicals diffuse outward and impact the cylindrical substrate to assist in forming a nitride layer on the interior of the cylindrical substrate.
20 . The system of claim 19 , additionally comprising magnetic means for confining the electron beam to produce a geometrically well-defined, spatially uniform plasma sheet.
21 . The system of claim 19 , wherein the relative position of said electron beam and substrate is adjustable.
22 . The system of claim 19 , wherein said substrate is biased, heated, or both.
23 . The system of claim 22 , wherein said heating may be direct, indirect, or both.
24 . The system of claim 19 , wherein said substrate comprises a ferrous alloy, aluminum, an aluminum alloy, or any combination thereof.Join the waitlist — get patent alerts
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