US2011298465A1PendingUtilityA1
Process monitor and semiconductor manufacturing apparatus
Est. expiryOct 31, 2022(expired)· nominal 20-yr term from priority
Inventors:Mitsuhiro Yuasa
H10P 74/273H10W 20/496H10P 72/0604H10P 74/00H10P 50/242
49
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Claims
Abstract
A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operation time or an operation timing, etc. Furthermore, unauthorized use is prevented by storing a keyword in an ROM of the process monitor.
Claims
exact text as granted — not AI-modified1 . A process monitoring apparatus for monitoring a semiconductor manufacturing process, comprising: a container element; a monitor element including a wafer and a plurality of sensors attached to the wafer, the monitor element being able to be transferred into target environments in a process facility or into the container element by a transfer robot; and an electronics module attached to the container element, the electronics module being available for communication with the monitor element when the monitor element is transferred into the container element.
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