Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method

Abstract

A method of fabricating a photomask may include forming a light-shielding layer and a first resist film on a substrate, forming a first resist pattern by exposing first exposed regions of the first resist film to a first exposure source that may have a first energy, forming a first light shielding pattern by etching the selectively exposed light-shielding layer by using the first resist pattern as an etching mask, removing the first resist pattern, forming a second resist film on the first light-shielding layer, exposing second exposed regions of the second resist film that may have a desired pattern shape to a second exposure source that may have a second energy, forming a second light shielding pattern by etching the selectively exposed first light shielding pattern by using the second resist pattern as an etching mask, and removing the second resist pattern.

1 .- 13 . (canceled) 
     
     
         14 . An apparatus for fabricating a photomask, comprising:
 a vacuum chamber;   a transfer chamber including a transfer arm;   an arranging chamber for arranging the photomasks;   a first exposure chamber for exposing surfaces of the photomasks to a first exposure source having a first energy; and   a second exposure chamber for exposing the surfaces of the photomasks to a second exposure source having a second energy.   
     
     
         15 . The apparatus as claimed in  claim 14 , wherein the first exposure source is an electron beam, and the second exposure source is an electron beam or light. 
     
     
         16 . The apparatus as claimed in  claim 14 , wherein the first exposure source emits higher energy than the second exposure source. 
     
     
         17 . The apparatus as claimed in  claim 14 , wherein the first exposure source emits energy that has an acceleration voltage higher than that of the second energy. 
     
     
         18 . (canceled) 
     
     
         19 . (canceled) 
     
     
         20 . A photomask, fabricated by the apparatus for fabricating a photomask according to  claim 14 .