Electrolyte and method for deposition of matte metal layer

Abstract

This invention relates to an electrolyte as well as a method for the deposition of a matte metal layer on a substrate surface, where the matte metal layer is V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, In, Sn, Sb, Te, Re, Pt, Au, TI, Bi, or an alloy thereof, and there is a halogenide, sulphate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron to facilitate deposition of a smooth and even layer with much lower deposition metal requirements.

1 - 36 . (canceled) 
     
     
         37 . An electrolytic composition for the deposition of a matte layer of metal or alloy on a substrate surface, comprising:
 deposition metal ions selected from the group consisting of V, Cr, Mn, Fe, Co, Ni, Cu, Ru, Rh, Pd, Ag, In, Sn, Sb, Te, Re, Pt, Au, Tl, Bi, and combinations thereof for depositing a metal or alloy of the foregoing;   at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron;   wherein the sodium, potassium, aluminum, magnesium, and/or boron is in a concentration within the range between 10% and 100% by weight of the concentration of the deposition metal ions; and   one or more of a dispersion former selected from the group consisting of unsubstituted polyalkylene oxide, substituted polyalkylene oxide, a derivative of a substituted or unsubstituted polyalkylene oxide, a fluorinated wetting agent, a perfluorinated wetting agent, a quaternary amine, or a quaternary amine substituted with polyalkylene oxide.   
     
     
         38 . The electrolytic composition of  claim 37  wherein the deposition metal ions are selected from the group consisting of Fe, Co, Ni, Cu, Sn, Ag, and combinations thereof. 
     
     
         39 . The electrolytic composition according to  claim 37  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of sodium methanesulfonate and hydrates thereof, potassium methanesulfonate and hydrates thereof, magnesium methanesulfonate and hydrates thereof, aluminum sulfate and hydrates thereof, or a boron tetrafluoride. 
     
     
         40 . The electrolytic composition according to  claim 37  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of aluminum sulfates and hydrates thereof, sodium sulfates and hydrates, and magnesium sulfates and hydrates thereof, and any combination thereof. 
     
     
         41 . The electrolytic composition according to  claim 38  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of sodium methanesulfonate and hydrates thereof, potassium methanesulfonate and hydrates thereof, magnesium methanesulfonate and hydrates thereof, aluminum sulfate and hydrates thereof, or a boron tetrafluoride. 
     
     
         42 . The electrolytic composition according to  claim 38  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of aluminum sulfates and hydrates thereof, sodium sulfates and hydrates, and magnesium sulfates and hydrates thereof, and any combination thereof. 
     
     
         43 . The electrolytic composition according to  claim 38  wherein the deposition metal ions comprise nickel ions and the sodium, potassium, aluminum, magnesium, and/or boron is present in a concentration such that the weight ratio of the sodium, potassium, aluminum, magnesium, and/or boron to the nickel ions is at least about 0.4:1. 
     
     
         44 . The electrolytic composition according to  claim 38  wherein the deposition metal ions comprise cobalt ions and tin ions and the sodium, potassium, aluminum, magnesium, and/or boron is present in a concentration such that the weight ratio of the sodium, potassium, aluminum, magnesium, and/or boron to the sum of the cobalt ions and tin ions is at least about 0.4:1. 
     
     
         45 . The electrolytic composition of claim  1  further comprising a surface active wetting agent selected from the group consisting of alkyl sulfates, sulfo-succinic acid, and betaines. 
     
     
         46 . A method for depositing a matte layer on a surface of a substrate, the method comprising:
 exposing the surface of the substrate to an electrolytic plating composition comprising:   deposition metal ions selected from the group consisting of V, Cr, Mn, Fe, Co, Ni, Cu, Ru, Rh, Pd, Ag, In, Sn, Sb, Te, Re, Pt, Au, Tl, Bi, and combinations thereof for depositing a metal or alloy of the foregoing;   at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron; and   one or more of a dispersion former selected from the group consisting of unsubstituted polyalkylene oxide, substituted polyalkylene oxide, a derivative of a substituted or unsubstituted polyalkylene oxide, a fluorinated wetting agent, a perfluorinated wetting agent, a quaternary amine, or a quaternary amine substituted with polyalkylene oxide; and   conducting a current between the substrate and an anode to thereby deposit the matte layer on the surface of the substrate.   
     
     
         47 . The method of  claim 46  wherein the deposition metal ions are selected from the group consisting of Fe, Co, Ni, Cu, Sn, Ag, and combinations thereof. 
     
     
         48 . The method of  claim 46  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of sodium methanesulfonate and hydrates thereof, potassium methanesulfonate and hydrates thereof, magnesium methanesulfonate and hydrates thereof, aluminum sulfate and hydrates thereof, or a boron tetrafluoride. 
     
     
         49 . The method of  claim 46  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of aluminum sulfates and hydrates thereof, sodium sulfates and hydrates, and magnesium sulfates and hydrates thereof, and any combination thereof. 
     
     
         50 . The method of  claim 47  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of sodium methanesulfonate and hydrates thereof, potassium methanesulfonate and hydrates thereof, magnesium methanesulfonate and hydrates thereof, aluminum sulfate and hydrates thereof, or a boron tetrafluoride. 
     
     
         51 . The method of  claim 47  wherein the at least one halogenide, sulfate, or sulfonate of an element of the group consisting of sodium, potassium, aluminum, magnesium, or boron is one or more from the group consisting of aluminum sulfates and hydrates thereof, sodium sulfates and hydrates, and magnesium sulfates and hydrates thereof, and any combination thereof. 
     
     
         52 . The method of  claim 46  wherein the electrolytic composition further comprises a surface active wetting agent selected from the group consisting of alkyl sulfates, sulfo-succinic acid, and betaines. 
     
     
         53 . The method of  claim 46  wherein the matte layer is a nickel layer and the method comprises:
 exposing the surface of the substrate to an electrolytic nickel plating composition comprising at least about 10 g/L nickel ions and said auxiliary metal ion selected from the group consisting of sodium, potassium, magnesium, aluminum, boron, or combinations thereof, wherein a weight ratio of auxiliary metal ions to nickel metal ions is at least about 0.8:1; and 
 conducting a current between the substrate and an anode to thereby deposit the matte nickel layer on the surface of the substrate. 
 
     
     
         54 . The method of  claim 46  wherein the weight ratio of auxiliary metal ions to nickel ions is at least about 1:1. 
     
     
         55 . The method of  claim 46  wherein the matte layer is a cobalt-tin layer and the method comprises:
 exposing the surface of the substrate to an electrolytic cobalt-tin alloy plating composition comprising at least about 10 g/L cobalt ions, at least about 10 g/L tin ions, and an auxiliary metal ion selected from the group consisting of sodium, potassium, magnesium, aluminum, boron, or combinations thereof, wherein a weight ratio of auxiliary metal ions to sum of the cobalt metal ions and the tin metal ions is at least about 0.2:1; and 
 conducting a current between the substrate and an anode to thereby deposit the matte cobalt-tin alloy layer on the surface of the substrate.